Mild routes to bulk boron nitride and molecular oxoboranes

本项目的目的是寻找一种温和的途径来获得大块氮化硼和分子氧硼烷。氮化硼具有优异的电绝缘和导热性能以及化学惰性和热惰性，有潜力成为现代计算中的关键材料。氮化硼的合成通常需要1500°C以上的温度，这使得这些方法与标准设备制造协议不兼容。该计划包括低温聚合物介导的散装氮化硼途径，并建立在一系列已知转化的基础上。单体氧硼烷（RBO; R =有机基团或H）只在高温下的气相中观察到。硼和氧之间的高活性三键通常在高于50 K的温度下导致环寡聚化。该计划的第二个目标是大体积n -杂环烯烃配体对单体氧硼烷的动力学稳定，这在低配位主基化学中是有用的。如果获得一个动力学稳定的单体氧硼烷，将探索氧硼烷在硅烷存在下促进C-F键活化和最终氢脱氟催化的能力。

The aim of this project is to find a mild route to bulk boron nitride and molecular oxoboranes. Boron nitride has the potential to be a key material in modern computing as a result of its outstanding electrical insulating and heat-conducting properties and its chemical and thermal inertness. The syntheses of boron nitride generally require temperatures above 1500°C, making these methods incompatible with standard device fabrication protocols. The proposed program includes a low-temperature polymer-mediated route to bulk boron nitride and is built upon a series of known transformations. Monomeric oxoboranes (RBO; R = organic group or H) are only observed in the gas phase at high temperatures. The highly reactive triple bond between boron and oxygen generally leads to cyclooligomerization at temperatures higher than 50 K. A second goal of this program is the kinetic stabilization of monomeric oxoborane by bulky N-heterocyclic olefin ligands, which were shown to be useful in the context of low coordinate main group chemistry. If a kinetically stabilized monomeric oxoborane is obtained, the oxoborane will be explored for its ability to promote C-F bond activation and eventually hydrodefluorination catalysis in the presence of silanes.