INTERNAL PROCESSING OF LIGHT ABSORPTION MEDIUM BY USE OF SELF-FOCUS INDUCED BY ULTRASHORT PULSE LASER AND ANALYSIS OF PROCESSING PHENOMENA
INTERNAL PROCESSING OF LIGHT ABSORPTION MEDIUM BY USE OF SELF-FOCUS INDUCED BY ULTRASHORT PULSE LASER AND ANALYSIS OF PROCESSING PHENOMENA
批准号:
23246029
负责人:
OHMURA ETSUJI
金额:
$3.83万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (A)
财政年份:
2011
资助国家:
日本
项目状态:
已结题
起止时间:
2011-11-18 至 2014-03-31
中文摘要
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英文摘要
The beam diameter, the beam profile and the transmittance of an ultrashort pulse laser propagating in a transparent medium were measured. The optical analysis was performed by considering the beam propagation, the self-focusing and the nonlinear absorption of ultrashort pulse laser in a Kerr medium. Comparing with the experimental results, the nonlinear absorption coefficients of BK7 and fused silica were calculated. Furthermore, the internal processing and the lap welding of glass were conducted with an ultrashort pulse laser. Using the measurement results of the absorption ratio in the inside of glass, heat conduction analysis was carried out, and the processing mechanism was discussed.
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Analysis of internal processing phenomena of glass by repetitive irradiation of ultrashort pulse laser
超短脉冲激光重复照射玻璃内部加工现象分析
DOI:
--
发表时间:
2013
期刊:
On-line Proceedings of the 6th International Congress on Laser Advanced Materials Processing (LAMP2013)
影响因子:
--
作者:
[Kenji Fukuzawa, Qingqing Liu, Takumi Tarukado, Yosuke Kajihara, Ryota Watanabe, Shintaro Itoh, Hedong Zhang, 宝珍 善伸, T.Murakami and E.Ohmura]
通讯作者:
T.Murakami and E.Ohmura
Analyses of self-focusing phenomenon and temperature rise in light absorption medium by ultrashort pulse laser irradiation
超短脉冲激光照射光吸收介质自聚焦现象及温升分析
DOI:
--
发表时间:
2013
期刊:
Materials Science and Engineering Technology
影响因子:
--
作者:
[Yosuke Kajihara, Kenji Fukuzawa, Shintaro Itoh, Ryota Watanabe, Hedong Zhang, 加々良 剛志, Etsuji Ohmura]
通讯作者:
Etsuji Ohmura
ガラスのレーザスクライブにおける境界要素法を用いた亀裂進展解析
玻璃激光划片中边界元法裂纹扩展分析
DOI:
--
发表时间:
2013
期刊:
影响因子:
--
作者:
[Akio Ishii, Ju Li and Shigenobu Ogata, Yuzo Kitazawa, J. Matsuo, 加地史弥,堀田陽亮,高橋 哲,高増 潔, 八幡恵輔・清水政二・村上正直・大村悦二]
通讯作者:
八幡恵輔・清水政二・村上正直・大村悦二
Suitable Processing Conditions Determined from the Standpoint of Residual Strain in Laser Scribing of Glass
从玻璃激光划片残余应变的角度确定合适的加工条件
DOI:
--
发表时间:
2012
期刊:
Proceedings of the 31st International Congress on Application of Laser and Electro-Optics (ICALEO2012)
影响因子:
--
作者:
[Keisuke Yahata, Etsuji Ohmura, Seiji Shimizu and Masanao Murakami]
通讯作者:
Seiji Shimizu and Masanao Murakami
Analyses of Self-Focusing Phenomenon and Temperature Rise in Fused Silica by Ultrashort Pulse Laser Irradiation
超短脉冲激光辐照熔融石英自聚焦现象及温升分析
DOI:
10.1016/j.procir.2013.01.002
发表时间:
2013
期刊:
Procedia CIRP
影响因子:
--
作者:
[Kenji Fukuzawa, Qingqing Liu, Takumi Tarukado, Yosuke Kajihara, Ryota Watanabe, Shintaro Itoh, Hedong Zhang, T. Seki, Etsuji Ohmura]
通讯作者:
Etsuji Ohmura
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