Benetzung lateral strukturierter Polymeroberflächen

横向结构化聚合物表面的润湿

• 批准号: 5109026
• 负责人: Professor Dr. Georg Krausch
• 金额: --
• 依托单位: Präsident
• 依托单位国家: 德国
• 项目类别: Priority Programmes
• 财政年份: 1998
• 资助国家: 德国
• 起止时间: 1997-12-31 至 2006-12-31
• 项目状态: 已结题
• 来源: https://gepris.dfg.de/gepris/projekt/5109026?language=en
• 关键词: Benetzung; lateral; strukturierter; Polymeroberfl; chen

The proposed project concerns the wetting properties of nanoscopically patterned substrates. It comprises both the preparation and characterization of suitable substrates and an investigation of their wetting properties. Two different self-assembly processes will be utilized to create surfaces with a controlled variation of surface energy on molecular length scales: (a) micro-phase separation in ultra-thin films of ABC triblock copolymers with selectively adsorbing B middle block or novel graft copolymers with selectively adsorbing backbone, and (b) spontaneous facetting of miscut silicon single crystals followed by glancing angle metal evaporation. In either case, regular patterns of chemical composition are formed with characteristic length scales between 30 and 200 nm. So far, the project has mainly dealt with production and characterization of the substrate surfaces. In addition, first experiments have been performed to study the wetting properties of homopolymers and block copolymers on such substrates. In the following two years, these experiments will be systematically continued. The patterned surfaces will be available as model substrates to other members of the Schwerpunktprogramm.

拟议的项目涉及纳米图案化衬底的润湿特性。它包括合适底物的制备和表征以及对其润湿性能的研究。两种不同的自组装过程将被用来产生表面能在分子长度尺度上可控变化的表面：(A)具有选择性吸附B的中间嵌段的ABC三嵌段共聚物或具有选择性吸附主链的新型接枝共聚物的超薄膜中的微相分离；以及(B)错切的硅单晶的自发分面，随后掠角金属蒸发。在任何一种情况下，形成具有30到200 nm之间的特征长度尺度的化学成分的规则图案。到目前为止，该项目主要涉及基片表面的生产和表征。此外，还首次对均聚物和嵌段共聚物在这种基质上的润湿性能进行了实验研究。在接下来的两年里，这些实验将系统地继续进行。图案化的表面将作为模型衬底提供给Schwerpenkt计划的其他成员。