Benetzung lateral strukturierter Polymeroberflächen

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The proposed project concerns the wetting properties of nanoscopically patterned substrates. It comprises both the preparation and characterization of suitable substrates and an investigation of their wetting properties. Two different self-assembly processes will be utilized to create surfaces with a controlled variation of surface energy on molecular length scales: (a) micro-phase separation in ultra-thin films of ABC triblock copolymers with selectively adsorbing B middle block or novel graft copolymers with selectively adsorbing backbone, and (b) spontaneous facetting of miscut silicon single crystals followed by glancing angle metal evaporation. In either case, regular patterns of chemical composition are formed with characteristic length scales between 30 and 200 nm. So far, the project has mainly dealt with production and characterization of the substrate surfaces. In addition, first experiments have been performed to study the wetting properties of homopolymers and block copolymers on such substrates. In the following two years, these experiments will be systematically continued. The patterned surfaces will be available as model substrates to other members of the Schwerpunktprogramm.