The Synthesis of Titanium Diboride Film by a Reactive RF Ion Plating Method

反应性射频离子镀法合成二硼化钛薄膜

• 批准号: 60550498
• 负责人: SATO Tadao
• 金额: $ 1.15万
• 依托单位: Muroran Institute of Technology.
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (C)
• 财政年份: 1985
• 资助国家: 日本
• 起止时间: 1985 至 1986
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-60550498/
• 关键词: Titanium Diboride; RF Ion Plating Method; CVD法

This study was attempted to deposit <TiB_2> thin film on metal substrates at low temperature, about 140゜C, by a new method whose system was combined with an ion plating Method and a CVD one ; Ti was supplied to substrates by an RF ionplating method and B by a CVD method by the hydrogen reduction of <BCl_3> . Source gas ratio [ <H_2> / <BCl_3> ] was more effective for the formation of tinanium compounds than any other experimental condition. Titanium compound layers synthesized were classified into eight patterns on their main composition identified by X-ray diffraction ; type <I> , <TiH_(1.924)> , type <II> , <TiH_2> and Ti, type <III> ,Ti and <Ti_2B_5> , type <IV> ,TiB and Ti, type <V> , <TiB_2> and <Ti_3B_4> , type <VI> , <Ti_2B_5> and TiB, type <VII> , <Ti_2B_5> and <TiB_2> , type <VIII> , <TiB_2> . The highest hardness of thelayers was about Hv=1400 <kgfmm^(-2)> obtained at a specimen of type <V> . Generally, the cohearrency between the layers and aluminium substrate was the best of all. After this, a mechanism for the formation of titanium borides by this method will be invesigated.

本研究尝试<TiB_2>在低温（约140 ℃）下用一种新的方法在金属基底上沉积存款薄膜，该方法将离子镀法和CVD法相结合，通过RF离子镀法向基底提供Ti，通过CVD法通过氢气还原向基底提供B<BCl_3>。源气比[<H_2>/<BCl_3>]对锡化合物的形成比其他实验条件更有效。用X射线衍射法对钛化合物层的主要成分进行了分析，将钛化合物层分为8种类型：型<I>、&lt;TiH_（1.924）&gt;型<II>、<TiH_2>和Ti型<III>、Ti和<Ti_2B_5>型<IV>、TiB和Ti型、和<V><TiB_2><Ti_3B_4>型<VI>、<Ti_2B_5>和TiB型<VII>、<Ti_2B_5><TiB_2>和型<VIII><TiB_2>。型试样的最高硬度约为Hv=1400 &lt;kgfmm^（-2）&gt;<V>。一般来说，涂层与铝基体之间的共渗性最好。之后，将研究通过这种方法形成钛硼化物的机制。

项目成果

Tadao Sato: "The Synthesis of Titanium Boride Film by a Reactive Ion Plating Methode" DENKI KAGAKU.

佐藤忠雄：“反应离子镀法合成硼化钛薄膜”电气化学。

佐藤忠夫: 電気化学および工業物理化学.

佐藤忠雄：电化学和工业物理化学。