Study on Monitoring of Radio Frequency Glow Discharge Plasma
Study on Monitoring of Radio Frequency Glow Discharge Plasma
批准号:
62550017
负责人:
MACHI Yoshio
金额:
$0.77万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (C)
财政年份:
1987
资助国家:
日本
项目状态:
已结题
起止时间:
1987 至 1988
中文摘要
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英文摘要
Optical emission profile (OEP) between parallel cathode and anode electrodes was proposed for monitoring and characterizing radio frequency (rf) glow discharge plasma, and H_2, N_2 and Ar glow discharges were examined. The cathode sheath width was evaluated quite easily by the OEP, because the boundary of the ion sheath and the plasma lay just at a peak position in the OEP. Only H_2 discharge has a doublet peak and a second peak corresponded to the boundary. The plasma parameters are measured by the Langmuir probe method, and the relative mean electronenergy Te in H_2 and N_2 plasmas is found to be evaluated by the ion sheath width Is with a relationship Te Is. The plasma density can also be estimated by both the cathode negative potential Vc and Is.The quick measurement of the OEP using a CCD image sensor was also examined for the practical palsma processings. Although the CCD technique brought the somewhat deviated OEP because of the difficulty in the representation of the parallel electrodes at a two dimentional image through an optical lens, the precise ion sheath widths were also to be evaluated, especially for relatively narrow sheath widths. The CCD image sensor combined with a macro-lens with the focal distance of 105mm was quite successful for measuring the sheath width.
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Nobuki Mutsukura: Journal of Applied Physics.
睦仓信树:应用物理学杂志。
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通讯作者:
Nobuki Mutsukura: "Monitoring of Radio Frequency Glow Discharge Plasma" Journal of Applied Physics.
Nobuki Mutsukura:“射频辉光放电等离子体的监测”应用物理学杂志。
DOI:
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通讯作者:
Nobuki Mutsukura.: Journal of Applied Physics.
睦仓信树:应用物理学杂志。
DOI:
--
发表时间:
期刊:
影响因子:
--
作者:
[]
通讯作者:
小林,大倉,町: 第11回イオン工学シンポジウム「イオン源とイオンを基礎とした応用技術」. 481-484 (1987)
Kobayashi, Okura, Town:第 11 届离子工程研讨会“离子源和基于离子的应用技术”481-484 (1987)。
DOI:
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影响因子:
--
作者:
[]
通讯作者:
ANALYSIS OF EEG WITH CONCENTRATED CONDITION
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批准号:08650512
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$1.28万
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财政年份:1996
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负责人:MACHI Yoshio
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依托单位:
海外基金