Study of Soft X-Ray Optical Constants of Thin Films and Development of Soft X-Ray Multilayer Optics

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Various Kinds of soft x-ray multilayer optical elements have been developed with bases of fundamental studies of optical constants measurements and of initial growth processes. The outputs of the project can be summarized as follows.1. Optical constants of thin film samples of 15 materials useful for soft x-ray multilayers such as Si, Mo, C, Sic, Rh, Ru were measured. (M. Yanagihara, J. Cao, M. Yamamoto, A. Arai, S. Nakayama, T. Mizuide, and T. Namioka : optical Constants of Superthin Go-ld Films for Soft X-Rays, Rev. Sci. Instrum. 60, pp. 2014-2017(1989))2. Optical constants have also been derived by measuring the total photoelectron yield of thin film samples. The optical constants well coincide to those obtained by the standard reflectance vs. angle of incidence method above (1.). This demonstrates the reliability of the data obtained. (Abst. of annual meeting of Japan Society of Applied Physics, March 1991)3. In-Situ ellipsometry has been applied for the study of initial growth processes of ultra-thin films, which revealed the minimum thicknesses of the continuous film after the island structure. (M. Yamamoto and T. Namioka : In-situ Ellipsometric Study of Optical Properties of Ultrathin Films, submitted to Appl. Opt.)4. New soft x-ray optics such as multilayer filters, multilayer polarizers have been developped. With these optics, first systematic polarization measurements has been successfully carried at a wavelenth of 10nm. (H. Kimura, T. Maehara, M. Yamamoto, M. Yanagihara, W. Okamoto, S. Mitani, and T. Namioka : Polarization of SR measured by soft x-ray multilayer polarizers, to be published in Photon Factory Activity Report #8(1990))