Study of Soft X-Ray Optical Constants of Thin Films and Development of Soft X-Ray Multilayer Optics

薄膜软X射线光学常数研究及软X射线多层光学器件的发展

• 批准号: 63420023
• 负责人: NAMIOKA Takeshi
• 金额: $ 21.5万
• 依托单位: Tohoku University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (A)
• 财政年份: 1988
• 资助国家: 日本
• 起止时间: 1988 至 1990
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-63420023/
• 关键词: soft x-ray; multilayer; optical constant; ultrathin film; soft x-ray optics; soft x-ray spectro-reflectometer

Various Kinds of soft x-ray multilayer optical elements have been developed with bases of fundamental studies of optical constants measurements and of initial growth processes. The outputs of the project can be summarized as follows.1. Optical constants of thin film samples of 15 materials useful for soft x-ray multilayers such as Si, Mo, C, Sic, Rh, Ru were measured. (M. Yanagihara, J. Cao, M. Yamamoto, A. Arai, S. Nakayama, T. Mizuide, and T. Namioka : optical Constants of Superthin Go-ld Films for Soft X-Rays, Rev. Sci. Instrum. 60, pp. 2014-2017(1989))2. Optical constants have also been derived by measuring the total photoelectron yield of thin film samples. The optical constants well coincide to those obtained by the standard reflectance vs. angle of incidence method above (1.). This demonstrates the reliability of the data obtained. (Abst. of annual meeting of Japan Society of Applied Physics, March 1991)3. In-Situ ellipsometry has been applied for the study of initial growth processes of ultra-thin films, which revealed the minimum thicknesses of the continuous film after the island structure. (M. Yamamoto and T. Namioka : In-situ Ellipsometric Study of Optical Properties of Ultrathin Films, submitted to Appl. Opt.)4. New soft x-ray optics such as multilayer filters, multilayer polarizers have been developped. With these optics, first systematic polarization measurements has been successfully carried at a wavelenth of 10nm. (H. Kimura, T. Maehara, M. Yamamoto, M. Yanagihara, W. Okamoto, S. Mitani, and T. Namioka : Polarization of SR measured by soft x-ray multilayer polarizers, to be published in Photon Factory Activity Report #8(1990))

在光学常数测量和初始生长过程的基础研究的基础上，已经开发出各种软X射线多层光学元件。该项目的成果可概括如下： 1．测量了 15 种可用于软 X 射线多层材料（例如 Si、Mo、C、Sic、Rh、Ru）的薄膜样品的光学常数。 （M. Yanagihara、J. Cao、M. Yamamoto、A. Arai、S. Nakayama、T. Mizuide 和 T. Namioka：软 X 射线超薄金薄膜的光学常数，Rev. Sci. Instrum. 60，第 2014-2017 年（1989 年））2。光学常数也可以通过测量薄膜样品的总光电子产率得出。光学常数与通过上述标准反射率与入射角方法获得的光学常数非常一致 (1.)。这证明了所获得数据的可靠性。 （日本应用物理学会年会摘要，1991 年 3 月）3．原位椭圆光度法已用于研究超薄膜的初始生长过程，揭示了岛结构后连续薄膜的最小厚度。 （M. Yamamoto 和 T. Namioka：超薄膜光学特性的原位椭偏研究，提交给 Appl. Opt.）4。新型软X射线光学器件如多层滤光片、多层偏振器已被开发出来。利用这些光学器件，首次在 10nm 波长下成功进行了系统偏振测量。 （H. Kimura、T. Maehara、M. Yamamoto、M. Yanagihara、W. Okamoto、S. Mitani 和 T. Namioka：用软 X 射线多层偏振器测量的 SR 偏振，将发表在 Photon Factory Activity Report #8（1990）中）

项目成果

波岡 武: "放射光用光学素子" O plus E. 123. 78-84 (1990)

Takeshi Namioka：“同步加速器辐射的光学元件”O plus E. 123. 78-84 (1990)

H.Kimura: "Polarization of SR measured by soft xーray multilayer polarizers" to be published in Photon Factory Activity Report. 8. (1990)

H.Kimura：“用软 X 射线多层偏振器测量的 SR 的偏振”将发表在 Photon Factory Activity Report 8 中（1990 年）。

M. Yamamoto, S. Nakayama, and T. Namioka: "Optimum Design Method of Multilayer Elements" Proc. SPIE. 984. 160-165 (1989)

M. Yamamoto、S. Nakayama 和 T. Namioka：“多层元件的优化设计方法”Proc。

M.Yanagihara: "Inーsitu performance of soft xーray multilayer mirrors exposed to synchrotron radiation from a bending magnet" Photon Factory Activity Report. 8. (1990)

M.Yanagihara：“暴露于来自弯曲磁体的同步加速器辐射的软 X 射线多层镜的原位性能”光子工厂活动报告 8。（1990 年）。

S.Mitani: "Apparatus for Characterizing the VUV and Soft XーRay Optical Elements at the Photon Factory" Rev.Sci.Instrum.60. 2216-2218 (1989)

S.Mitani：“光子工厂中表征 VUV 和软 X 射线光学元件的装置”Rev.Sci.Instrum.60 (1989)。