Development of Soft X-Ray Sources and Optical Elements for X-Ray Lithography

用于 X 射线光刻的软 X 射线源和光学元件的开发

• 批准号: 59850007
• 负责人: NAMIOKA Takeshi
• 金额: $ 5.57万
• 依托单位: Tohoku University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Developmental Scientific Research
• 财政年份: 1984
• 资助国家: 日本
• 起止时间: 1984 至 1985
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-59850007/
• 关键词: lithography; soft x-rays; multilayer; mirror; laser-produced plasma; 軟X線光源

Laser-produced plasmas generated on Fe, W, Sm, Yb targets by a Qswitched Nd:YAG laser (Quanta-Ray DCR-2(10)) have been studied for the purpose of a soft x-ray source for x-ray lithography. 20-30 degree angle of incidence of laser beam to the target was found to be best compromise between a contamination level og a mask fue to deposition of target material and a useful level of the soft x-ray output. With 60-90 sec (600-900 pulses) exposures using a Fe target, a polyimide supported resolution-test pattern in gold for 0.0005 mm resolution was fully reproduced in photo-resist (Hitachi Kasei RE-5000P), showing a resolution of 500 nm or better.Multilayer mirrors were fabricated by ion-beam sputtering, which was in-situ monitored by an ellipsometer having 0.01 nm thickness sensitivity. A Mo-Si 27-layer mirror showed a peak reflectivity of 17.5% at a wavelength of 13.8 nm at normal incidence (9.6 degrees). Using a WYCO surface profiler, RMS roughness of the substrates and the multilayers was found to be about 0.6nm.The soft x-ray source and the multilayer mirror thus developed have shown their potentiality for the application to soft x-ray lithography.

本文研究了用量子射线DCR-2(10)激光在Fe、W、Sm、Yb靶上产生的激光等离子体，作为X射线光刻用的软X射线源。激光入射到靶的20-30度角被发现是沉积靶材料的掩模的污染水平和软X射线输出的有用水平之间的最佳折衷。用铁靶曝光60-90秒(600-900个脉冲)，在光刻胶(日立凯成RE-5000P)上完全复制了分辨率为0.0005 mm的聚酰亚胺支持的金色分辨率测试图样，分辨率为500 nm或更高。在垂直入射(9.6°)条件下，在13.8 nm波长下，Mo-Si27层反射镜的峰值反射率为17.5%。用Wyco表面轮廓仪测量了基片和多层膜的均方根粗糙度约为0.6 nm，软X射线源和多层膜反射镜在软X射线光刻中显示出潜在的应用前景。

项目成果

ICO-13, Conf. Digest. (1984)

ICO-13，会议。

ICO-13,Conf.Digest. (1984)

ICO-13，会议摘要。

ICVUV-8,Ext.Abstr.(1986)

ICVUV-8，Ext.Abstr.(1986)

ICVUV-8, Extended Abstracts. (1986)

ICVUV-8，扩展摘要。

J.Spectrosc.Soc.Jpn.34-6. (1985)

J.Spectrosc.Soc.Jpn.34-6。