Photodissociation Dynamics on Surface Probed by Vacuum uv Laser.

真空紫外激光探测表面的光解动力学。

基本信息

批准号：
01044008
负责人：
KAWASAKI Masahiro
金额：
$ 3.84万
依托单位：
Hokkaido University
依托单位国家：
日本
项目类别：
Grant-in-Aid for international Scientific Research
财政年份：
1989
资助国家：
日本
起止时间：
1989 至 1990
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-01044008/
关键词：
Photoelectron Spectroscopy Gallium Photodissociaiton Hydrogen Vacuum uv Chloride Multiphoton

项目摘要

Pyrolytic and photolytic dissociation of trimethylgallium on Si, Au, and Al substrates was studied by X-ray and UV photoelectron spectroscopy technique. On an Si (111) substrate, gallium metal and CH_n radicals are deposited by pyrolytic dissociation up to 670 K. On a polycrystalline Au substrate, gallium metal was observed while Cls signal disappeared at 470 K. Photodissociation of monolayered Ga(CH_3)_2 at 266 nm gives XPS spectra for CH_n radicals and Ga metal on the Si wafer while at 355 nm no decomposition was observing.Laser irradiation at 193 or 351 nm of a multilayer of Cl_2 or CH_3Cl on an Si wafer at 100 K leads to both photodissociation of these molecules and formation of photoetching products. The kinetic energy distributions of photofragments (Cl, CH_3) and etching products (SiCl, SiCiC_2) were measured. The kinetic energy distribution of Cl or CH_3 is bimodal for the case of thin deposition of parent molecules on substrates.The Doppler profiles of the hydrogen atom photo fragments from the photodissociation of HCl and HBr at vacuum UV region are observed to determine the symmetries of the higher electronic states by using a resonance enhanced multiphoton ionization technique.Alkyl chlorides (R = CH_3, C_2H_5, C_3H_7, and C_4H_9), chloromethanes (CH_nCl_<4-n>), and chlorofluoromethanes (CF_nCl_<4-n>) are photodissociated at vacuum UV region. The chlorine atom photo fragments are detected by a resonance-enhanced multiphoton ionization technique. The symmetries of the electronic states are determined from angular distributions of photofragments.

通过X射线和UV光电子光谱技术研究了三甲基甲基属的热解和光解分离。在SI（111）底物上，甘露仪和CH_N自由基通过高达670 K的热解解离沉积。在多晶Au底物上，观察到Cls信号在470 K处观察到CLS信号在470 K处消失。在355 nm时，未观察到没有分解。在193或351 nm处的cl_2或ch_3cl的351 nm辐照在100 k的si晶圆上，既导致这些分子的光解相结合，又导致光蚀刻产物的形成。测量了光碎片（CL，CH_3）和蚀刻产物（SICL，SICIC_2）的动能分布。 Cl或CH_3的动能分布是双峰的，对于底物上母体分子的沉积较薄。 C_2H_5，C_3H_7和C_4H_9），氯乙烷（CH_NCL_ <4-n>）和氯氟乙烷（CF_NCL_ <4-n-n>）在真空UV区域是光电分离的。氯原子照片片段通过共振增强的多光子电离技术检测到。电子状态的对称性取决于光碎片的角分布。