课题基金 / 基金详情

Electrical and Optical Properties of Granular Semiconductor Thin Films and Their Applications tO Electronic Devices

Electrical and Optical Properties of Granular Semiconductor Thin Films and Their Applications tO Electronic Devices
颗粒半导体薄膜的电学和光学特性及其在电子器件中的应用
批准号:
63550229
负责人:
MORISAKI Hiroshi
金额:
$1.47万
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (C)
财政年份:
1988
资助国家:
日本
项目状态:
已结题
起止时间:
1988 至 1990

项目摘要

项目成果

MORISAKI Hiroshi的其他基金

相关文献

中文摘要
翻译
In the former section of the present study,Si-SiO_2multi-layered thin films have been fabricated by ion beam sputtering deposition technique.The structure has been utilized for observing possible quantum-size effects which are expected to become significant when the thickness of Si layers within the multi-layered structure becomes thin enough。Unfortunately,infrared Raman spectroscopy has shown that the Si layer is non-crystalline or fine poly-crystalline states。In the latter section,crystalline Si fine particles have been prepared by both gas evaporation and arc discharge techniques.Strong photoluminescence with subbandgap photon energies has been observed in the Si fine particles thus prepared.After oxidation of the fine particles,the photoluminescence has become abovebandgap of Si,the band tail covering the visible light region。This blue shift has been explained by aquantum-size effect originated from Si quantum dots.Several fine structures noted in the photoluminescence spectra have been explained consistently by radiative recombination of electrons and holes within a three-dimensional quantum well taking into account the presence of both heavy and light holes。
英文摘要
In the former section of the present study, SiーSiO_2 multiーlayered thin films have been fabricated by ion beam sputtering deposition technique. The structure has been utilized for observing possible quantum-size effects which are expected to become significant when the thickness of Si layers within the multiーlayered structure becomes thin enough. Unfortunately, infrared Raman spectroscopy has shown that the Si layer is non-crystalline or fine poly-crystalline states. In the latter section, crystalline Si fine particles have been prepared by both gas evaporation and arc discharge techniques. Strong photoluminescence with subbandgap photon energies has been observed in the Si fine particles thus prepared. After oxidation of the fine particles, the photoluminescence has become abovebandgap of Si, the band tail covering the visible light region. This blue shift has been explained by aquantum-size effect originated from Si quantum dots. Several fine structures noted in the photoluminescence spectra have been explained consistently by radiative recombination of electrons and holes within a three-dimensional quantum well taking into account the presence of both heavy and light holes.
期刊论文(43)
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会议论文
H.Morisaki: J.Electrochem.Soc.136. (1989)
H.Morisaki:J.Electrochem.Soc.136。
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通讯作者:
小野 洋: "Tiocc2DD/Pt粒状金属薄膜酸素センサ" 電子情報通信学会技術研究報告. ED87ー168. 1-6 (1988)
小野浩:“Tiocc2DD/Pt颗粒金属薄膜氧传感器”IEICE技术研究报告ED87-168(1988)。
DOI: --
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通讯作者:
岩瀬 満雄: "イオンビ-ムスパッタリングによる粒状金属薄膜の製作" プレ-ティングとコ-ティング. 8. 248-251 (1988)
Mitsuo Iwase:“通过离子束溅射制造粒状金属薄膜”电镀和涂层。 8. 248-251 (1988)
DOI: --
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通讯作者:
H. Morisaki, A. Nishikawa, H. One and K. Yazawa: "Electronic State Densities of Ferrocene and Anthracene in Non-aqueous Solvents Determined by Electrochemical Tunneling Spectroscopy" J. Electrochem. Soc.137. 2759 (1990)
H. Morisaki、A. Nishikawa、H. One 和 K. Yazawa:“通过电化学隧道光谱测定非水溶剂中二茂铁和蒽的电子态密度”J. Electrochem。
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