Highly-conductive Transparent Films Sputter-deposited under Water Vapor Atmosphere

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Indium-Tin-Oxide (ITO) files are widely used for transparent electrodes of liquid crystal display device etc. The object of the present project is to establish a deposition process by a novel sputtering method under the atmosphere of water vapor to obtain highly-conductive transparent films without heating the substrates.In the first year (1989's), the optimization of the deposition parameters was successfully completed. In the second year (1990's), it was scheduled that the film properties be understood by the growth mechanism which was affected by the deposition parameters. The following results were obtained at the present :1) The carrier concentration in the film decreased when the thick films were deposited without water vapor introduction, while high carrier concentration was maintained when deposited under the atmosphere of water vapor.2) The water vapor enhanced the crystal growth which explains the increase of carrier mobility.3) The experimental data for the above mentioned 1) and 2) were extremely deviated.4) The film properties were influenced remarkably by the surface condition of the substrate. The influence of the surface condition had never been unpredicted before the experiments.