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Development of toroidal plasma sputtering apparatus for depositing films with excellent properties

开发出用于沉积具有优异性能的薄膜的环形等离子体溅射装置

基本信息

批准号：
03555058
负责人：
TAKAHASHI Takakazu
金额：
$ 7.62万
依托单位：
Toyama university
依托单位国家：
日本
项目类别：
Grant-in-Aid for Developmental Scientific Research (B)
财政年份：
1991
资助国家：
日本
起止时间：
1991 至 1992
项目状态：
已结题

项目摘要

A New type of sputtering method which can form a stable toroidal plasma has been developed in order to prepare Al films with homogeneous and dense structure and excellent properties on the plasma-free substrates.A toroidal plasma (TP) sputtering apparatus with a pair of targets has been developed in order to deposit the multilayers. The magnetic field was induced by the NdFeB permanent magnet.At first, dc discharge and sputtering characteristics were investigated by using a planar ring target of Al with a purity of 99.999%. Ar gas was used as a sputtering gas. In the case of the permanent magnet attached behind the target, the applied voltage was lower to 300V at Ar gas pressure of 0.5mTorr.The structure and the properties of Al films have been investigated. In the films with the thickness below 0.5 mum, the film surface was extremely smooth and its reflectivity was reached to 90%. The as-deposited films were composed of fcc phase crystallites with Al (111), Al (200) and Al (200) planes normal to the film plane.The resistivity of the as-deposited films decreased from 5 to 2.5 muOMEGA.cm with increasing the film thickness from 0.07 to 1 mum. On the other hand, that increased from 2.5 to 5 muOMEGA.cm with increasing the Ar gas pressure from 0.5 to 10mTorr.Accordingly, this method may be useful for depositing the aluminum with a smmoth Accordingly, this method may be useful for depositing the aluminum with a smooth and flat surface and homogeneous and dense structure.

为了在无等离子体衬底上制备结构均匀致密、性能优良的铝膜，提出了一种新型的能形成稳定的环形等离子体的溅射方法。研制了一种具有一对靶的环形等离子体溅射装置，用于沉积多层膜。磁场由钕铁硼永磁体感应产生。首先，采用纯度为99.999%的平面环形靶材，研究了直流放电和溅射特性。氩气被用作溅射气体。在目标体后面附着永磁体的情况下，在0.5mTorr的氩气压力下，施加电压降至300V。研究了铝膜的结构和性能。在厚度小于0.5 mm的薄膜中，薄膜表面非常光滑，反射率达到90%。沉积膜由Al（111）、Al（200）和Al（200）三面垂直于膜面的fcc相晶组成。沉积膜的电阻率由5 μ ω降至2.5 μ ω。随着膜厚从0.07到1 μ m的增加，膜厚度增加。另一方面，从2.5个增加到5个。氩气压力从0.5 mtorr增加到10mTorr。因此，本方法可用于沉积具有光滑表面的铝。因此，本方法可用于沉积具有光滑平坦表面和均匀致密结构的铝。