Evaluation of atomic layer at metal-metal interfaces with field ion microscope

用场离子显微镜评估金属-金属界面的原子层

基本信息

  • 批准号:
    03650026
  • 负责人:
  • 金额:
    $ 1.34万
  • 依托单位:
  • 依托单位国家:
    日本
  • 项目类别:
    Grant-in-Aid for General Scientific Research (C)
  • 财政年份:
    1991
  • 资助国家:
    日本
  • 起止时间:
    1991 至 1992
  • 项目状态:
    已结题

项目摘要

Atomic states and the growth of Pd ultra-thin-layer on W, Ta, Mo and Nb substrate surfaces and a hydrogen interaction with Pd monolayer film have been investigated with field ion microscopy(FIM). The Pd adlayer observed at the Pd-substrate interface is most stable and is formed pseudomorphic structure. When the pseudomorphic Pd monolayer is formed, Work function is shown maximum value. Desorption field strengthes of the pseudomorphic Pd monolayer grew on the W(011), Ta(011), Mo(011) and Nb(011) found to be 52 V/nm, 46 V/nm, 44 V/nm and 39 V/nm, respectively. These values depend strongly on the evaporation field of substrate atom. Pd intrinsic overlayer grown on Ta and Mo surfaces and their atomic states have been also investigated. Difference of the atomic states of Pd overlayer and stable pseudomorphic Pd layer could clearly be distinguished from the FIM images and the desorption field strength. When Pd 20-30 atomic layers were deposited on the substrates (011) plane, the crystal orientation grown of Pd(111)*Mo(011) and Pd(111)*Ta(011) found. Hydrogen interaction with the Pd monolayer on W(011) and Mo(011) surface has also been examined, and the desorption field strength were observed to show an exponential decay with hydrogen increment. Thermal surface diffusion processes of Pd pseudomorphic monolayer on Mo(011) surface were also analyzed.
用场离子显微镜研究了在W、Ta、Mo和Nb衬底表面上Pd超薄膜的原子状态和生长以及氢与Pd单层膜的相互作用。在Pd-衬底界面处观察到的Pd吸附层是最稳定的,并形成假晶结构。当形成赝晶Pd单分子层时,功函数出现极大值。在W(011)、Ta(011)、Mo(011)和Nb(011)上生长的赝晶Pd单层膜的脱附场强分别为52 V/nm、46 V/nm、44 V/nm和39 V/nm。这些值强烈依赖于衬底原子的蒸发场。研究了在Ta和Mo表面生长的Pd本征覆盖层及其原子状态。从表面形貌图和脱附场强可以清楚地区分出Pd覆盖层和稳定的赝晶Pd层的原子状态的差异。当在(011)面上沉积20-30原子层Pd时,发现Pd(111)*Mo(011)和Pd(111)*Ta(011)的晶体取向,并研究了氢与W(011)和Mo(011)面上Pd单层膜的相互作用,观察到脱附场强随氢的增加呈指数衰减。分析了Pd赝晶单层膜在Mo(011)表面的热扩散过程。

项目成果

期刊论文数量(6)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
奥野 公夫: "Pd/M(M:W,Ta,Mo,Nb)原子界面とPd成長層のFIM観察"
Kimio Okuno:“Pd/M(M:W,Ta,Mo,Nb)原子界面和Pd生长层的FIM观察”
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  • 影响因子:
    0
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  • 通讯作者:
Okuno KIMIO: "FIM Observation of the Pd Ultra Thin Layer deposited on Metal surface" Applied Surface Science.
Okuno KIMIO:“金属表面沉积的 Pd 超薄层的 FIM 观察”应用表面科学。
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    0
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  • 通讯作者:
Kimio,OKUNO: "FIM Observation of the Pd Ultra Thin Layer Deposited on Metal surfaces" Applied Surf.Sci.
Kimio,OKUNO:“金属表面沉积的 Pd 超薄层的 FIM 观察”Applied Surf.Sci。
  • DOI:
  • 发表时间:
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  • 影响因子:
    0
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  • 通讯作者:
Kimio,OKUNO: "FIM Observations of the Pd /M (M : W, Mo, Ta, Nb) Atomic Interfaces and The Pd Growth Layer" J.of the Vacuum Soc.of Jpn.
Kimio,OKUNO:“Pd /M(M:W、Mo、Ta、Nb)原子界面和 Pd 生长层的 FIM 观察”J.of the Vacuum Soc.of Jpn。
  • DOI:
  • 发表时间:
  • 期刊:
  • 影响因子:
    0
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  • 通讯作者:
Kimio,OKUNO: "FIM Observation of the Pd Ultra Thin Layer deposited Metal surfaces"
Kimio,OKUNO:“Pd 超薄层沉积金属表面的 FIM 观察”
  • DOI:
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  • 影响因子:
    0
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OKUNO Kimio其他文献

OKUNO Kimio的其他文献

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{{ truncateString('OKUNO Kimio', 18)}}的其他基金

Evaluation of Semiconductor-Metal Atomic Interfaces with High Field Microscopies
用高场显微镜评估半导体-金属原子界面
  • 批准号:
    08650039
  • 财政年份:
    1996
  • 资助金额:
    $ 1.34万
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)

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