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Development of large-area Diamond Film Synthesis Apparatus by Chemical Vapor Deposition using Arc Discharge Plasma

电弧放电等离子体化学气相沉积大面积金刚石薄膜合成装置的研制

基本信息

批准号：
04555033
负责人：
HIRATA Atsushi
金额：
$ 7.68万
依托单位：
Tokyo Institute of Technology
依托单位国家：
日本
项目类别：
Grant-in-Aid for Developmental Scientific Research (B)
财政年份：
1992
资助国家：
日本
起止时间：
1992 至 1993
项目状态：
已结题

项目摘要

In order to enlarge the diamond deposition area by arc discharge plasma jet chemical vapor deposition, a newly type of apparatus that has one cathode plasma torch and three anode plasma torches has been developed. These four plasma torch can be moved along their own axs, discharge area is changeable with changing the arrangement of the plasma torches. In this research, the possibility of the enlargement of the diamond deposition area by this appatatus has been discussed, and the growth rate, the film shape and properties of synthesized diamond films have been evaluated. Moreover, the mechanical properties of the diamond film has been characterized by applying the diamond film for cutting tool that was mode by YAG laser cutting technique and polishing technique by heat-chemical reaction with hot metal plate.As a result, the diamond deposition area has been enharged at up to 40mm in diameter with increasing the discharge area when the pressure has been 200 Torr and methane concentration has been 4%. It is more effective for enlargement of the diamond deposition area to increase the discharge distance in the direction that is perpendicular to the axis of the plasma jet. The growth rate has been incerased with increasing the dischaege distance because the number of active species has increased. However, the film shape that central part is thicker has not changed when the discharge distance has been varied. Moreover, the crystallinity of the diamond film was characterized by Raman spectroscopy and it has been found that good crystallinity has been obtained independent of the arrangement of the plasma torches.The diamond film has been shaped into a cutting edge and cutting of aluminum alloy was performed. The result of the experiments shows that the this CVD diamond film can be usued for ultraresicion cutting tool and has the same mechanical strength as natural diamond.

为了扩大电弧放电等离子体喷射化学气相沉积金刚石的沉积面积，研制了一种由1个阴极等离子体炬和3个阳极等离子体炬组成的新型装置。这四个等离子炬可沿各自的轴方向移动，放电面积随等离子炬布置的变化而变化。在本研究中，讨论了该装置扩大金刚石沉积面积的可能性，并对合成的金刚石薄膜的生长速率、薄膜形状和性能进行了评价。此外，将金刚石膜应用于YAG激光切割成型的刀具和热化学抛光技术，对金刚石膜的力学性能进行了表征。结果表明，当压力为200 Torr，甲烷浓度为4%时，随着放电面积的增大，金刚石沉积区直径增大至40mm。在垂直于等离子体射流轴线方向增加放电距离对扩大金刚石沉积面积更为有效。随着放水距离的增加，其生长速率也随之增加，这是由于放水距离增加了活性物种的数量。而随着放电距离的变化，中心部分较厚的膜形没有发生变化。此外，用拉曼光谱对金刚石薄膜的结晶度进行了表征，发现其结晶度与等离子炬的排列方式无关。将金刚石膜成形为切削刃，并对铝合金进行切削。实验结果表明，该CVD金刚石膜可用于超切刀具，且具有与天然金刚石相同的机械强度。