New high Performance Gas Separation membrane Prepared From Novel Reaction Route

新型反应路线制备的新型高性能气体分离膜

• 批准号: 05555252
• 负责人: KATO Masao
• 金额: $ 4.42万
• 依托单位: Science University of Tokyo
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Developmental Scientific Research (B)
• 财政年份: 1993
• 资助国家: 日本
• 起止时间: 1993 至 1994
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-05555252/
• 关键词: Gas Separation Membrane; Silicon-Containing Polymers; Novel Synthesis; Si-Containing Polymers With Reactive Groups; Interfacial Polymerizations; 酸素富化膜; 含ケイ素スチレン; 界面重縮合; ガラス転移点; 酸素溶解度; ガス分離; フリースペース

For creation of gas separation membrane with a high performance, we started to prepare novel membrane materials from our original reaction routes. Relation between the polymer structure and their characteristics was also investigated in detail.Using-4-methylstirene as starting material, several types of Si-containing stirene monomers were synthesized. From gas permeability measurements of the polymer membrane thus obtained, polystirene with bis (trimethylsilyl) methyl group at para position (polySi2) showed fairly high gas permeability (P_<O2>=45 barrer) . Affinity of oxygen molecule toward organosilicon moiety is one of the reason to show such high gas permeability. Actually, with increasing Si-content in the polystirene membrane, the solubility of oxygen increased. However, the polystirene with three Si atoms in each monomeric unit (PolySi3) showed one order of magnitude low permeability than polySi2. It is very curious that PolySi3 showed low Tg (90ﾟC) than that of polySi2 (160ﾟC). Contrary to the large free space of polySi2, polySi3 may decrease free space due to the packing by the flexible side chains.Copolymerization of Si-containing stirenes with methacryloyl chloride provided reactive copolymers with acid chloride moiety as pendant groups with desired extent.Interfacial polycondensation of the copolymer thus obtained with diamines gave ultra thin films. Such ultra thin film is promising as gas separation membrane wit high flux.

为了创造高性能的气体分离膜，我们开始从我们原来的反应路线制备新型膜材料。以-4-甲基苯乙烯为原料，合成了几种含硅苯乙烯单体。对所制得的聚合物膜的透气性测试表明，帕拉含双（三甲基硅基）甲基的聚苯乙烯（polySi_2）具有较高的透气性（P_<O2>=45 barrer）。氧分子对有机硅部分的亲和力是显示出如此高的透气性的原因之一。实际上，随着聚苯乙烯膜中Si含量的增加，氧的溶解度增加。然而，在每个单体单元中具有三个Si原子的聚苯乙烯（PolySi 3）显示出比polySi 2低一个数量级的磁导率。非常奇怪的是，PolySi 3显示出比polySi 2（160 ° C）低的Tg（90 ° C）。与聚Si_2的大自由空间相反，聚Si_3由于柔性侧链的堆积而减小了自由空间.含硅苯乙烯与甲基丙烯酰氯的共聚反应得到了以酰氯为侧基的反应性共聚物，所得共聚物与二胺的界面缩聚得到了超薄膜.这种超薄膜有望作为高通量气体分离膜。

项目成果

加藤政雄、長崎幸夫 他: "Isomerization polymerizations of 4-substiuted styrenes-Synthesis of macromonomers with amino and/or silyl groups" Macromolecules. 27 25. 7236-7239 (1994)

Masao Kato、Yukio Nagasaki 等人：“4-取代苯乙烯的异构化聚合 - 具有氨基和/或甲硅烷基的大分子单体的合成”《高分子》。

M,Kato,S.Hashidate,T.Hirayama: "Synthesis and Propertis of Polymers Having Photocrosslinkable Moieties for Second‐order Nonlinear Optics" J.Photopolymer Sci.& Techn.211-214 (1993)

M、Kato、S. Hashidate、T. Hirayama：“用于二阶非线性光学的具有光交联部分的聚合物的合成和性能”J. Photopolymer Sci.& Techn.211-214 (1993)

加藤典聖、長崎幸夫、加藤政雄: "新規含有機金属高分子による電子線レジストへのアプローチ" 無機高分子2, (1993)

Noriyoshi Kato、Yukio Nagasaki 和 Masao Kato：“使用新型有机金属聚合物的电子束抗蚀剂方法”Inorganic Polymers 2，(1993)

Yukio Nagasaki, Eiichi Honzawa, Masao Kato, Kazunori Kataoka, Teiji Tsuruta: "Synthesis of Poly (silamine) Telechelics and Its Solution Properties" Macromolecules, Communication to the Editor. 27 (17). 4848-4850 (1994)

Yukio Nagasaki、Eiichi Honzawa、Masao Kato、Kazunori Kataoka、Teiji Tsuruta：“聚（硅胺）遥爪化合物的合成及其溶液性质”大分子，致编辑的通讯。

長崎幸夫: "Reza Arshady,Ed ACS Washington,DC" Functional Polymers for Emerging Technologies (in press), (1995)

Yukio Nagasaki：“Reza Arshady，Ed ACS Washington，DC”用于新兴技术的功能聚合物（正在印刷中），（1995 年）