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Research on the Glow Discharge Cleaning Method by Use of Glow Mode Plasma Source

辉光模式等离子体源辉光放电清洗方法的研究

基本信息

批准号：
05558054
负责人：
KAWABE Takaya
金额：
$ 1.28万
依托单位：
University of Tsukuba
依托单位国家：
日本
项目类别：
Grant-in-Aid for Developmental Scientific Research (B)
财政年份：
1993
资助国家：
日本
起止时间：
1993 至 1994
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-05558054/
关键词：
ultra-high vacuum discharge cleaning impurities desorption discharge pressure sputtering trapping グロー放電

项目摘要

Although there are many merits in the glow discharge cleaning method to have ultra-high vacuum within a short time, such as use of simple equipment and without usage of the magnetic field, because of large cathode fall (typically 300 volt), it has some problems, such as the sputtering of the vacuum wall by the bombardment of the plasma ions, trapping of the discharge gas in the vacuum chamber, and slow pumping speed of the pumping system due to the high gas pressure during cleaning discharge. To solve those problems and to improve the glow discharge cleaning method, we introduced an auxiliary plasma source of glow mode plasma source (GMPS) by use of hot cathode, and we demonstrated the solution of those problems.As results of the experimental investigation, the working pressure of the discharge gas could be reduced to 0.2 Pa, which is about two order of magnitudes smaller. The cathode fall and the difference of the potential between the plasma and the vacuum chamber are reduced to several 10 volts.We have also investigated the mechanism of the desorption of the impurity gases during the discharge cleaning. The argon, hydrogen, deuterium gases are used as the discharge gases, and temporal variation of the partial pressure of those gases have been measured. As the results from this study, the dominant desorption mechanism of the impurity gases within a short time is due to the physical process, which is bombardment of the ions. On the other hand, in a longer time of the operation, the chemical process is the dominant desorption mechanism.From those results mentioned above, we concluded that the discharge cleaning method with use of GMPS is quite effective method by improving the demerit of the normal glow discharge cleaning methods.It can be said that this discharge cleaning method with use of GMPS is quite effective to obtain ultra-high vacuum within a short time.

虽然辉光放电清洗法具有设备简单、不需要磁场等优点，但由于阴极压降大，（典型地为300伏），但是它存在一些问题，例如等离子体离子轰击引起的真空壁的溅射，放电气体在真空室中的捕获，以及由于清洁排放期间的高气体压力而导致泵送系统的泵送速度慢。为了解决这些问题，改进辉光放电清洗方法，我们提出了一种利用热阴极的辉光模式等离子体源（GMPS）辅助源，并对这些问题进行了实验研究，实验结果表明，放电气体的工作压强可降低到0.2Pa，比传统的辉光放电清洗方法降低了两个数量级。阴极压降和等离子体与真空室之间的电位差减小到几十伏。我们还研究了放电清洗过程中杂质气体的脱附机理。氩气，氢气，氘气被用作放电气体，和这些气体的分压的时间变化已被测量。从这项研究的结果，在短时间内的杂质气体的主要解吸机制是由于物理过程，这是轰击的离子。另一方面，在较长的操作时间内，化学过程是主要的解吸机制。通过对普通辉光放电清洗方法缺点的改进，得出了利用GMPS的放电清洗方法是一种非常有效的方法，可以说，利用GMPS的放电清洗方法是一种非常有效的获得超在短时间内达到高真空。