METALLIC MULTILAYERS PREPARED ON MICROSTRUCTURES SUBSTRATES

在微结构基底上制备金属多层膜

• 批准号: 07554009
• 负责人: SHINJO Teruya
• 金额: $ 12.99万
• 依托单位: KYOTO UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (A)
• 财政年份: 1995
• 资助国家: 日本
• 起止时间: 1995 至 1997
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-07554009/
• 关键词: Microfabrication; Metallic multilayr; Giant magnetoresistance; Magnetic microwire; V-groove; 微細加工技術; V字溝基板; 非結合型GMR; スピン依存散乱; 巨視的量子効果; 微細加工基板; 巨大磁気抵抗効果; 金属人工格子; 非結合型MR効果; 三角溝構造

Recent developments of thin film preparation techniques have made possible to control each layr thickness on angstrom scale but in general the size and shape regarding to the directions in plane are not controlled. Microfabrication techniques are rather popular in the semiconductor fields but not yet fully applied for metallic films. The basic idea of the present investigation is to prepare new type metallic multilayr films by depositing on microstructured substrates. On Si surfaces, V-shaped micro grooves were fabricated and utilized as substrates for deposition. Non-coupled type GMR (giant magnetoresistance) multilayrs were deposited on V-groove substrates and GMR in the geometry with current in an angle to the plane was measured. The enhancement of GMR was confirmed in the geometry and the utility of microstructured substrate is proved. It was also shown that microwires of magnetic layrs with the width of 0.3mum can be prepared by depositing in a tilted angle, which are of interests as model systems for basis magnetism studies.

薄膜制备技术的最新发展使得可以在埃尺度上控制每个层的厚度，但是通常不控制关于平面中的方向的尺寸和形状。微加工技术在半导体领域已相当普及，但在金属薄膜方面还没有得到充分应用。本研究的基本思路是在微结构基底上沉积制备新型金属多层膜。在硅表面上制作了V形微槽，并将其用作沉积衬底。在V型槽衬底上制备了非耦合型巨磁电阻（GMR）多层膜，并测量了电流与平面成一定角度时的几何形状的GMR。从几何结构上证实了巨磁电阻效应的增强，证明了微结构衬底的实用性。它也表明，磁性层的宽度为0.3微米，可以通过沉积在一个倾斜的角度，这是感兴趣的基础磁性研究的模型系统制备。

项目成果

T.Shinjo: "Magnetic Structure and Magnetoresistance of Metallic Multilayers" Thin Solid Films. 281-282. 469-473 (1996)

T.Shinjo：“金属多层膜的磁结构和磁阻”固体薄膜。

新庄輝也・小野輝男: "Magnetoresistance of Multilayers on Microstructured Substrates" J. Magnetism and Magnetic Materials. (印刷中). (1996)

Teruya Shinjo 和 Teruo Ono：“微结构基板上的多层磁阻”J. 磁性和磁性材料（出版中）。

新庄輝也・前川禎道(編著): "論文選集VII「巨大磁気抵抗効果」" 日本物理学会, 403 (1996)

Teruya Shinjo 和 Sadamichi Maekawa（编辑）：“论文选集 VII“巨磁阻效应”日本物理学会，403（1996）

T.Nagahama: "Magnetization Process and Magnetoresistance of Exchange Spring Bilayr Systems" J.Phys.D : Appl.Phys.31, No.1. 43-49 (1998)

T.Nagahama：“交换弹簧 Bilayer 系统的磁化过程和磁阻”J.Phys.D：Appl.Phys.31，No.1。

新庄輝也(共著): "磁性体ハンドブック" 朝倉書店(印刷中), (1996)

Teruya Shinjo（合著者）：《磁性材料手册》朝仓书店（正在出版），（1996）