METALLIC MULTILAYERS PREPARED ON MICROSTRUCTURES SUBSTRATES

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Recent developments of thin film preparation techniques have made possible to control each layr thickness on angstrom scale but in general the size and shape regarding to the directions in plane are not controlled. Microfabrication techniques are rather popular in the semiconductor fields but not yet fully applied for metallic films. The basic idea of the present investigation is to prepare new type metallic multilayr films by depositing on microstructured substrates. On Si surfaces, V-shaped micro grooves were fabricated and utilized as substrates for deposition. Non-coupled type GMR (giant magnetoresistance) multilayrs were deposited on V-groove substrates and GMR in the geometry with current in an angle to the plane was measured. The enhancement of GMR was confirmed in the geometry and the utility of microstructured substrate is proved. It was also shown that microwires of magnetic layrs with the width of 0.3mum can be prepared by depositing in a tilted angle, which are of interests as model systems for basis magnetism studies.