Development and Experimental Assesment of Computer Software to Analyze 3-D Rarefied Plasma Flow.

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The purpose of this study is to develop the computer software to analyze 3-D rarefied plasma flow. The experimental works are simultaneously done to correct and establish the computer software by comparing the both result. We performed the study as follows :1) The software for 3-D rarefied gas flow.The software progtammed by use of the direct simulation Monte Carlo method was developed and applied to the simulation of the gas flow in an etcher. Thereby we coud decide the relation between the flow rate and etch rate of water.2) The software for DC and RF plasma flow.These softwares are developed and used to analyze DC and RF plasma flows. We found that the effects of the gas pressure and applied voltage appear inside an ion sheath and a large secondary electron emission lead to the spatial oscillation of the electron density in DC plasma.averaged ion energy distribution function.3) Experimental analyzes of DC and RF plasma.We examined the effects of the gas pressure, applied voltage, and gas flow rate on DC plasma. Many detailed data such as electron density, electron temperature, plasma potential, and so on are presented in case of DC plasma. We found that our software works well. In RF plasma, we are doing the experiment to examine the effects of the gas pressure and applied power on RF plasma.