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Development and Experimental Assesment of Computer Software to Analyze 3-D Rarefied Plasma Flow.

用于分析 3-D 稀薄等离子体流的计算机软件的开发和实验评估。

基本信息

批准号：
07555059
负责人：
NANBU Kenichi
金额：
$ 8.58万
依托单位：
TOHOKU UNIVERSITY
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (A)
财政年份：
1995
资助国家：
日本
起止时间：
1995 至 1997
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-07555059/
关键词：
Rarefied gas flow RF discharge plasma Plasma processing PIC simulation DC discharge plasma Monte Carlo method Argon plasma Particle simulation method アルゴンプラズマ高周波放電プラズマ流放電プラズマ発生装置電場解析直流放電プロピル流荷電粒子・原子衝突プラズマ空間振動粒子シミュレーション

项目摘要

The purpose of this study is to develop the computer software to analyze 3-D rarefied plasma flow. The experimental works are simultaneously done to correct and establish the computer software by comparing the both result. We performed the study as follows :1) The software for 3-D rarefied gas flow.The software progtammed by use of the direct simulation Monte Carlo method was developed and applied to the simulation of the gas flow in an etcher. Thereby we coud decide the relation between the flow rate and etch rate of water.2) The software for DC and RF plasma flow.These softwares are developed and used to analyze DC and RF plasma flows. We found that the effects of the gas pressure and applied voltage appear inside an ion sheath and a large secondary electron emission lead to the spatial oscillation of the electron density in DC plasma.averaged ion energy distribution function.3) Experimental analyzes of DC and RF plasma.We examined the effects of the gas pressure, applied voltage, and gas flow rate on DC plasma. Many detailed data such as electron density, electron temperature, plasma potential, and so on are presented in case of DC plasma. We found that our software works well. In RF plasma, we are doing the experiment to examine the effects of the gas pressure and applied power on RF plasma.

本研究的目的是开发计算机软件来分析 3-D 稀薄等离子体流。同时进行实验工作，通过比较两者的结果来修正和建立计算机软件。我们进行了如下研究： 1)三维稀薄气流软件。开发了采用直接模拟蒙特卡罗方法编程的软件，并将其应用于刻蚀机内气体流动的模拟。从而确定水的流速和蚀刻速率之间的关系。2）直流和射频等离子体流软件。这些软件是开发用于分析直流和射频等离子体流的。我们发现离子鞘内部存在气压和外加电压的影响，大量的二次电子发射导致直流等离子体中电子密度的空间振荡。平均离子能量分布函数。3)直流和射频等离子体的实验分析。我们研究了气压、外加电压和气体流量对直流等离子体的影响。在直流等离子体的情况下，给出了许多详细数据，如电子密度、电子温度、等离子体电势等。我们发现我们的软件运行良好。在射频等离子体中，我们正在进行实验来检查气压和施加功率对射频等离子体的影响。