Development of Charging Device for Superfine Particles Using UV/Photoelectron Method
Development of Charging Device for Superfine Particles Using UV/Photoelectron Method
批准号:
07555261
负责人:
SAKAMOTO Kazuhiko
金额:
$6.72万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (A)
财政年份:
1995
资助国家:
日本
项目状态:
已结题
起止时间:
1995 至 1996
中文摘要
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英文摘要
UV/photoelectron method developed by us is a unique charging technique using the photoelectrons/negative ions emitted from a photoelectron emitter by UV irradiation under an application of weak electric field. In this work, the new type charger of cylindrical photoelectron emitter coated on 254nm of UV-lamp was developed ; cylindrical germicidal lamp with photoelectron emitter composed of Au (10nm) and tin-doped In_2O_3 (ITO) (5nm) was used as UV-light source to generate the photoelectrons/negative ions. Mono-dispersed NaCl particles (particle diameter : 24 and 56nm) were used as sample aerosols in our charging experiments. Superfine NaCl particles were charged with a box type charger developed previously and the above new type charger applying this charging technique and, the validity was examined based on the number concentration measured by a condensation nuclei counter. The considerable predominance of the new type charger over the box type charger was found in comparison of charging ratio and penetration ratio of uncharged superfine particles and, penetration ratio of charged particles (charging-penetration ratio) under the application of direct electric field. Although charging ratio was decreased by the application of alternating electric field in the charging region, charging-penetration ratio, the most important thing in counting the number of charged particles, was increased.
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Kazuhiko Sakamoto: "Development and Application of Removing Techniques for Indoor Trace Gaseous Pollutants Using Secondary Formation with UV Irradation and UV/Photoelectron Hethod" Proceedings of 13th International Symposium on Contamination Control. 236-
坂本一彦:《紫外辐照和紫外/光电子方法二次生成室内微量气态污染物去除技术的开发与应用》第十三届国际污染控制研讨会论文集。
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K.Sakamoto et al.: "Creation of Super Cleaning Space by Simulataneous Removal of Gaseous and Fine Particles Using UV/Photoelectron Systems" Proceedings of the 7th International Conference on Indoor Air Quality and Climate. Vol.4. 187-192 (1996)
K.Sakamoto 等人:“使用紫外线/光电子系统同时去除气体和细颗粒物,创造超级清洁空间”第七届室内空气质量和气候国际会议论文集。
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T.Fujii et al.: "Surface Contamination by Cleanroom Air" Proceedings of the 5th International Symposium on Semiconductor Manufacturing. 317-320 (1996)
T.Fujii 等人:“洁净室空气的表面污染”第五届国际半导体制造研讨会论文集。
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K.Sakamoto et al.: "Effect of O_3 on Particle Formation from SO_2 in DMA's Neutralizer" J.Aerosol Res.Jpn.9 (in press). (1977)
K.Sakamoto 等人:“O_3 对 DMA 中和器中 SO_2 颗粒形成的影响”J.Aerosol Res.Jpn.9(印刷中)。
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Kazuhiko Sakamoto: "Creation of Super Cleaning by Simultaneous Removal of Gaseous and Fine Partides Using UV/Catalyst and UV/Photoelection System" Proceedings of the 7th International Conference on Indoor Air Quality. 4. 187-192 (1996)
坂本和彦:“利用紫外线/催化剂和紫外线/光选系统同时去除气体和细小颗粒,创造超级清洁”第七届国际室内空气质量会议论文集。
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