Development of a System for Analysing Damage Mechanism of Coatings in Scratch Test

涂层划痕试验损伤机理分析系统的开发

• 批准号: 07555619
• 负责人: MUTOH Yoshiharu
• 金额: $ 0.51万
• 依托单位: Nagaoka University of Technology
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 1995
• 资助国家: 日本
• 起止时间: 1995 至 1996
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-07555619/
• 关键词: Scratch Test; Coating; Damage Mechanism; In situ Observation; Adhesive Strength

(1)A scratch test machine with in situ observable micrography has been developed. Frictional force and AE signal can also be monitored in the present machine to estimate the critical load. Failure processes of coatings can be continueously observed and monitored through a video recorder.(2)The critical loads for four kinds of thin films (CVD-TiC,PVD-TiC,CVD-TiN and PVD-TiN) coated on SKH57 high speed steel substrate could successfully be evaluated using the present scratch test system.(3)Scratch tests of Hf-coated glass were carried out and corresponding damage processes were observed in situ. Ling-shaped cracks were nucleated in Hf film with increase in compressive load. They were overlapped each other with movement of the indentor to occur local spalling of the film.

(1)A研制了一种可现场观察显微图像的划痕试验机。在本机中还可以监测摩擦力和AE信号以估计临界载荷。通过录像机可以连续观察和监控涂层的失效过程。（2）利用本划痕试验系统可以成功地测定SKH 57高速钢基体上CVD TiC、PVD-TiC、CVD TiN和PVD-TiN四种薄膜的临界载荷。（3）对镀膜玻璃进行了划痕试验，并对相应的损伤过程进行了原位观察。随着压缩载荷的增加，Hf膜中的环形裂纹形核。随着压头的移动，它们彼此重叠，从而发生膜的局部剥落。

项目成果

古口 日出男, 南雲 悦男: "逆解析手法による薄膜弾性定数の同定" 日本機械学会論文集. 62. 513-520 (1996)

Hideo Furuguchi、Etsuo Nagumo：“通过反演分析法识别薄膜弹性常数”，日本机械工程学会会刊 62. 513-520 (1996)。

Hideo KOGUCHI,Etsuo NAGUMO: "Determination of Elastic Moduli of Thin Films Using Inverse Technique" Trans.JSME. 62-594. 513-520 (1996)

Hideo KOGUCHI，Etsuo NAGUMO：“使用逆向技术测定薄膜的弹性模量”Trans.JSME。

武藤 睦治: "スクラッチ試験による蒸着皮膜の品質評価" 日本機械学会講演会資料集(V). 97-1. 294-295 (1997)

Mutsuji Muto：“通过划痕测试进行沉积膜的质量评估”日本机械工程师学会讲座材料 (V) 97-1 (1997)。

Tadanobu INOUE,Hideo KOGUCHI: "Suggestion for Disappearance Conditions of Stress Singularity in Dissimilar Materials" Trans.JSME. 62-593. 41-48 (1996)

Tadanobu INOUE，Hideo KOGUCHI：“异种材料中应力奇异性消失条件的建议”Trans.JSME。

Jin-Quan Xu, Yoshiharu MUTOH: "Singular Residual Stress Field near the Interface Edge" Trams.JSME. 62-597. 1219-1225 (1996)

Jin-Quan Xu，Yoshiharu MUTOH：“界面边缘附近的奇异残余应力场”Trams.JSME。