Dynamic Effect of Neutron Irradiation in Damaging process of Ceramics and Glasses
Dynamic Effect of Neutron Irradiation in Damaging process of Ceramics and Glasses
批准号:
07558284
负责人:
TANABE Tetsuo
金额:
$2.82万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (A)
财政年份:
1995
资助国家:
日本
项目状态:
已结题
起止时间:
1995 至 1997
中文摘要
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英文摘要
Dynamical measurements of the ion induced luminescence and in-reactor luminescence of SiO_2 glass have been performed. First the dynamic effect of the ion induced luminescence is compared between D^+ and He^+ ion irradiations, then the time evolution of the in-reactor luminescence change with neutron fluence are compared with those observed in the ion induced luminescence. Finally the origin of the luminescence center is discussedThe luminescence spectra of silica glasses induced by D^+ and He^+ irradiation have been found to be very similar to cathodoluminescence originated from the centers associated with oxygen vacancies and the intensity is proportional to the deposited energy by electron excitation irrespective of incident ion species. The luminescence intensity changes with the ion fluence, first increased, taking maximum and then gradually decreases to the nearly steady value after prolonged irradiation. When the fluence is converted to dpa (displacement per atom) value, changes of the luminescence intensity under D^+ and He^+ irradiations are very similar. From dynamical change of the luminescence intensify, the first increase of the luminescence intensity is attributed to the increase of newly produced point defect or oxygen deficiency due to the atomic displacement, while the decrease to the association of the point defects, for example, formation of Si segregation or more complex defects. In-reactor luminescence also reveals intensity increase caused by displacement effect of neutron.The present work clearly demonstrates that the dynamic measurement of the neutron and ion induced luminescence will give detailed information on the process of the defect formation in optically transparent materials
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T.Tanabe, S.Tanaka, K.Yamaguchi, N.Otsuki, T.Iida, M.Yamawaki: "Neutron-induced luminescence of ceramics" J.Nuclear Materials. 212-215. 1050-1055 (1994)
T.Tanabe、S.Tanaka、K.Yamaguchi、N.Otsuki、T.Iida、M.Yamawaki:“陶瓷的中子诱导发光”J.Nuclear Materials。
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T.Tanabe, M.Fujiwara and K.Miyazaki: "Ion induced luminescence of Al_2O_3 Proc.Intern.Symps.Materials Chemistry in Nuclear Environment" Proc.Intern.Symps.Materials Chemistry in Nuclear Environment, March 14-15,1996, Tsukuba, Japan. 803-813
T.Tanabe、M.Fujiwara 和 K.Miyazaki:“Al_2O_3 Proc.Intern.Symps.Materials Chemistry in Nuclear Environment 的离子诱导发光”Proc.Intern.Symps.Materials Chemistry in Nuclear Environment,1996 年 3 月 14-15 日,筑波
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田辺 哲朗: "Energetic particle induced luminescence of Al_2O_3" Journal of Nudear Materials. 233-237. 1344-1348 (1996)
Tetsuro Tanabe:“Al_2O_3 的能量诱导粒子发光”《核材料杂志》233-237(1996)。
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M.Fujiwara, T.Tanabe, H.Miyamaru and K.Miyazaki: "Ion-induced luminescence of silica glasses" Nuclear Instruments and Methods in Ohysics Research. B116. 536-541 (1996)
M.Fujiwara、T.Tanabe、H.Miyamaru 和 K.Miyazaki:“二氧化硅玻璃的离子诱导发光”原子物理研究中的核仪器和方法。
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M.Fujiwara,T.Tanabe 他2名: "Ion-induced luminescence of silica glasses" Nud.Instr.Methods in Physics Research. B116. 536-541 (1996)
M.Fujiwara、T.Tanabe 和其他 2 人:“二氧化硅玻璃的离子诱导发光”Nud.Instr.Methods in 物理研究 B116 (1996)。
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共 28 条
Tritium retention and erosion/deposition of first wall materials
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批准号:17206092
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$31.37万
-
财政年份:2005
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负责人:TANABE Tetsuo
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依托单位:
Chemical reaction control in nano-area by radiation -transformation of radiation physics to radiation chemistry -
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批准号:13358008
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$27.21万
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财政年份:2001
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负责人:TANABE Tetsuo
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依托单位:
Hydrogen recycling and tritiurn retention at plasma facing wall in a fusion reactor
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批准号:13480134
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$9.54万
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财政年份:2001
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负责人:TANABE Tetsuo
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依托单位:
Appliocation of High Z materials as Plasma Facing Materials
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批准号:10308020
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项目类别:Grant-in-Aid for Scientific Research (A).
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资助金额:$20.48万
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财政年份:1998
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负责人:TANABE Tetsuo
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依托单位:
Characteristics of High Z Materials as A plasma Facing Material
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批准号:05452395
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项目类别:Grant-in-Aid for General Scientific Research (B)
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资助金额:$4.42万
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财政年份:1993
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负责人:TANABE Tetsuo
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依托单位:
Dynamic Process of Hydrogen Recycling at First Wall
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批准号:03452303
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项目类别:Grant-in-Aid for General Scientific Research (B)
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资助金额:$3.71万
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财政年份:1991
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负责人:TANABE Tetsuo
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依托单位:
海外基金