Chemical reaction control in nano-area by radiation -transformation of radiation physics to radiation chemistry -

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(1) New in situ analysis methods to study materials modification near surface regions brought by ion implantation were developed utilizing various radiation like electrons, ions, laser photons, as a probe.(2) Applying EXELFS and EELS, developed by this study, damage process of graphite was examined. It is clearly demonstrated that some new type of bonding different from sp^2 accompanying flouren type structure formation in both electron-and ion-irradiation.(3) Glazing incidence electron microscopy was also developed and successfully applied for the surface modification like a blister formation. A new blistering mechanism was proposed for covalent and semiconductor materials based on ductile transformation.(4) Molecular dynamic approach was applied to examine the swelling of SiC by ion irradiation and probed to be very effective. It was found that in SiC, an additional mechanism i.e. changes of bond length between Si-Si and Si-C atoms and bond angles of Si-C-Si is contributing the swelling in addition to the void swelling.(5) The nano-identation method was also applied to examine change of surface mechanical properties by ion implantation and the material strength in nanometer thickness was successfully extracted.(6) Appling various simulation codes, energy conversion or damaging process in nano-range was extensively studied. It was found that electron excitation play very important role in damaging process of covalent and semiconductor materials.(7) Energy conversion of γ-ray through production of secondary electrons and photons was successfully demonstrated. A new electric cell driven by γ-ray source was developed.