权益分类	功能权益	普通用户	{{item.name}}会员
{{category.name}}	{{benefitItem.name}}

Study of Elastic Anharmonicity in Mo Thin Films

钼薄膜弹性非谐性研究

基本信息

批准号：
07650753
负责人：
KOIKE Jun-ichi
金额：
$ 1.41万
依托单位：
Tohoku University
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (C)
财政年份：
1995
资助国家：
日本
起止时间：
1995 至 1996
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-07650753/
关键词：
thin films elastic modulus elastic anharmonicity molybdenum mechanical property

项目摘要

Thin films have a larger residual stress than their bulk materials. The purpose of this project was to investigate a possible difference in the elastic moduli in thin films from the view poin of elastic anharmonicity. Experimentally, Mo thin films were sputter deposited on silicon substrates. The elastic properties of Mo thin films were studied for various deposition conditions. Deposition parameters included substrate temperature and a target power. Residual stress was measured by a laser curvature-measuring system. Residual strain was measured by a X-ray diffractometer. Elastic modulus and hardness were measured by a nano-indentation tester. The major obtained results were the following :(1)Mo thin films were under a compressive stress state for all deposition conditions. Residual stress were found to decrease with increasing substrate temperature and a target power. This tendency was attributed to the temperature dependence of the surface diffusivity and to the target power dependence of the kinetic energy of the deposited atoms.(2)Compressive stress and strain were found to be in a range of 0.4-1.2 GPa and 0.2-0.6%, respectively. The observed residual stress was twice as much as that of the bulk value of 0.4-0.6GPa. On the other hand, hardness and Young's modulus did not show any dependence on the deposition conditions and were approximately the same as the bulk values.These results indicate that residual stress and strain in thin films can be substantially affected by the deposition conditions and may take larger values than the bulk. In contrast, in the observed range of stress and strain, elastic anharmonicity can be neglected.

薄膜的残余应力比其块状材料大。本课题的目的是从弹性非调和性的角度探讨薄膜弹性模量可能存在的差异。实验中，在硅衬底上溅射沉积Mo薄膜。研究了不同沉积条件下钼薄膜的弹性性能。沉积参数包括衬底温度和目标功率。用激光曲率测量系统测量残余应力。用x射线衍射仪测量残余应变。用纳米压痕仪测定弹性模量和硬度。得到的主要结果如下：(1)在所有沉积条件下，Mo薄膜都处于压应力状态。残余应力随基体温度和靶功率的升高而减小。这种趋势归因于表面扩散系数的温度依赖性和沉积原子动能的靶功率依赖性。(2)压缩应力和应变分别在0.4 ~ 1.2 GPa和0.2 ~ 0.6%之间。观察到的残余应力是体积值0.4 ~ 0.6 gpa的2倍。另一方面，硬度和杨氏模量与沉积条件无关，与体积值基本相同。这些结果表明，薄膜中的残余应力和应变受沉积条件的影响很大，其值可能比块体大。相反，在应力应变观测范围内，弹性非谐性可以忽略不计。