Investigation of Image Sensors for Ultra High Resolution Imaging Systems
Investigation of Image Sensors for Ultra High Resolution Imaging Systems
批准号:
08455159
负责人:
SHIRAKI Hiromitsu
金额:
$1.66万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
1996
资助国家:
日本
项目状态:
已结题
起止时间:
1996 至 1998
中文摘要
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英文摘要
(1) We proposed a new photodiode to increase the charge handling capability of solid state image sensors. This photo diode includes an N^+ sidewall that surrounds the charge strage region of a conventional photo diode with a vertical overflow drain. The operation and performance of the diode were analyzed using the three dimensional numerical analysis. We found that an abrupt potential increase, produced around the boundary of the channel stop and the N^+ sidewall creates a flat potential profile that spread all over the storage region, at the beginning of the charge storage. This profile suppresses electron over-flow into the substrate that occurs due to the small amount of signal electron concentrated around the center of the storage region. Therefore, the N^+ sidewall increases the storable charge. For example, the charge handling capability of a conventional 3.0-mum diameter photodiode was improved by more than a factor of four by adding N^+ sidewall. The validity of the analysis w … More as confirmed from the results of one dimensional analys. This technology is useful for small diameter photodiode.(2) It is well known that the saturation signal level of a CCD image sensor including photodiode with vertical overflow rain varies strongly with the substrate impurity concentration. However, the analyti-I results between the saturation signal level and substrate impurity concentration has not been ob-Tained yet. The relation between them was calculated using the drift-diffusion model as a function of photodiode structure and operation condition. By comparing analytical and experimental results obtained from CCD image sensor chips, we found that the impuriy fluctuation at the peripherals of CZ, MCZ, and epitaxial wafers *11%, *16% abd *6%, respectivery. Those at the center were *7%, *9% and *6%, respectively. The distnctive features of the impurity fluctuation pattern for these wafers were therefore clarified. The minimum imuruty fluctuation level that can can be detected is almost 0.1%. Moreover, a novel photodide strucre that suppresses the fluctuation was proposed.(3) CCD shift register suitable for highly photo sensitive frame transfer CCD image sensors was proposed and the performance of it was analized using three-dimensional numerical analysis.(4) A digital noise reduction method applicable to video signal was proposed and tested. Less
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T.Kimura, H.Shiraki, T.Arano, N.Takatsuka: "A discussion on the Relation between Substrate Impurity Concentration Fluctuation and Saturated Signal Fluctution in the Charge Coupled Device Image Sensors" Jour. of the Institute of Electrical Engineers of Jap
T.Kimura、H.Shiraki、T.Arano、N.Takatsuka:“电荷耦合器件图像传感器中衬底杂质浓度波动与饱和信号波动之间关系的讨论”Jour。
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白木 木村 牛島: "VODつきホトダイオードにN^+側壁を設けることによる蓄積電荷量増加法の提案" 映像情報メディア学会誌. 53・4. (1999)
Shiraki、Kimura 和 Ushijima:“通过在带有 VOD 的光电二极管中提供 N^+ 侧壁来增加存储电荷量的提案”图像信息和电视工程师学会杂志 53・4。
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H.Shiraki, T.Kimura and N.Ushijima: "A proposal for Charge Storage Copacity Increase in a Photo Diode with VOD Sorrounded by N^+ Sidewall" Jour. of the Institute of Image Information and Television Engineers. Vol.53, No.4. (1999)
H.Shiraki、T.Kimura 和 N.Ushijima:“通过 N^ 侧壁环绕 VOD 提高光电二极管电荷存储容量的建议”Jour。
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荒野,白木,木村,高塚: "CCDイメージセンサにおける基板不純物密度ゆらぎの測定" 映像情報メディア学会. 53/2. 282-287 (1999)
Araya、Shiraki、Kimura、Takatsuka:“CCD 图像传感器中基板杂质密度波动的测量”图像信息和电视工程师研究所 53/2 (1999)。
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荒野,白木,木村,高塚: "CCDイメージセンサにおける基板不純物密度揺らぎの測定" 映像情報メディア学会誌. 53・2. 282-287 (1999)
Araya、Shiraki、Kimura、Takatsuka:“CCD 图像传感器中的基板杂质密度波动的测量”图像信息和电视工程师学会杂志 53・2(1999 年)。
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共 9 条
Study of CCD Register for High-Sensitivity and Low-Dark Current Imaging Devices
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批准号:13650367
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.24万
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财政年份:2001
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负责人:SHIRAKI Hiromitsu
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依托单位: