Developement of Analysing System for Characteistics of Electrification of Powder Particles

粉体颗粒带电特性分析系统的研制

• 批准号: 10555265
• 负责人: MASUDA Hiroaki
• 金额: $ 1.15万
• 依托单位: KYOTO UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 1998
• 资助国家: 日本
• 起止时间: 1998 至 1999
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-10555265/
• 关键词: Contact Potential Difference; Particles; Powder; Electrostatics; Tribo-electrification; Humidity; Temperature; Environmental Conditions; 粉体

In order to control characterization of powder electrification, it is important to analyze in measuring Contact Potential Difference (CPD). Modified Kelvin Zisman method developed in our laboratory is the most practical one to measure the contact potential difference. There are some problems in measuring CPD. First, the CPD influenced by environmental conditions, for example, humidity and room temperature. For the sample with small electric conductivity, it is difficult to measure CPD of many kinds of samples because long time required for charge relaxation.Purpose of this study is to develop contact potential difference measuring system, which can control the room temperature and the relative humidity and measure some kinds of samples simultaneously. Beside we will analyze the relationship between tribo-electrification and measured CPD.In this year, we prepared contact potential difference measuring system as follows.1.Improvement of the measuring systemThe automatic measuring system … More for some kinds of samples simultaneously is very effective because sample with high resistance requires for charge relaxation. Because this measuring method requires to analyze weak electric signals, we must set electro-magnetic shield to eliminate electric noise of external environment and keep to a minimum generation of electrification by mechanical motion of inner instruments. In last year, we designed and manufactured the measuring system that satisfied the demand of mentioned abode. In this year, we have repeated test measurements to enhance both accuracys of measurements and trust. Besides we have done some repairs to eliminate electric noise.2.Relationship between tribo-electrification and CPDWe have studied influence of environmental condition for actual dry operation process on tribo-electrification of particle. To put it concretely, we investigate between electrification and contact potential difference using the particles with surface of ferrite core coated by silicon resin under different environmental conditions. Less

为了控制粉体带电特性，对接触电位差（CPD）测量进行分析是非常重要的。本实验室提出的修正Kelvin-Zisman法是测量接触电位差最实用的方法。CPD的测量存在一些问题，首先，CPD受环境条件的影响，如湿度和室温。对于电导率较小的样品，由于电荷弛豫时间较长，难以对多种样品进行CPD测量，本研究的目的是研制一种能够控制室温和相对湿度，同时测量多种样品的接触电势差测量系统。此外，我们还将分析摩擦起电与测量的CPD之间的关系。今年，我们准备了以下接触电势差测量系统。1.测量系统的改进自动测量系统 ...更多信息 对于某些类型的样品，同时是非常有效的，因为高电阻的样品需要电荷弛豫。由于这种测量方法需要分析微弱的电信号，因此必须设置电磁屏蔽，以消除外部环境的电噪声，并将内部仪器的机械运动产生的带电降到最低。去年，我们设计和制造了满足上述住宅需求的测量系统。在这一年里，我们反复进行测试测量，以提高测量的准确性和信任度。2.摩擦起电与CPD的关系研究了实际干式运行过程中环境条件对颗粒摩擦起电的影响。具体而言，我们使用在不同环境条件下用硅树脂涂覆铁氧体磁芯表面的颗粒来研究带电和接触电位差之间的关系。少

项目成果

K. Tanoue, A. Ema and H. Masuda: "Effect of Material Transfer and Work Hardening of Metal Surface on the Current Generated by Impact of Particles"J. Chem. Eng. of Japan. 32・4. 544-548 (1999)

K. Tanoue、A. Ema 和 H. Masuda：“金属表面的材料转移和加工硬化对颗粒冲击产生的电流的影响”J. Chem. 32・4（1999 年）。 ）

K.Tanoue, A.Ema and H Masuda.: "Effect of Material Transfer and Work Hardening of Metal Surgace on the Current Generated by Impact of Particles"J.Chem. Eng. of Japan. 32・4. 544-548 (1999)

K.Tanoue、A.Ema 和 H Masuda.：“金属表面的材料转移和加工硬化对颗粒冲击产生的电流的影响”J.Chem. 32・4（1999 年）。 ）

K.Tanoue,M.Yamaguchi,H.Masuda: "Electrostatic control of particle coating"Advanced Powder Technolo.. 10・2. 119-132 (1999)

K.Tanoue、M.Yamaguchi、H.Masuda：“粒子涂层的静电控制”Advanced Powder Technolo.. 10・2（1999）

野村俊之、谷口格崇、増田弘昭: "粉体の摩擦帯電特性に及ぼす操作環境条件の影響"粉体工学会誌. 36・3. 418-424 (1999)

Toshiyuki Nomura、Kazutaka Taniguchi、Hiroaki Masuda：“操作环境条件对粉末摩擦电性能的影响”粉末工程学会杂志 36・3（1999 年）。

K.Tanoue, M.Yamaguchi, H.Masuda: "Electrostatic control of particle coating" Advanced Powder Technology. (accepted).

K.Tanoue、M.Yamaguchi、H.Masuda：“颗粒涂层的静电控制”先进粉末技术。