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Application of Chaos Theory to Design for Precise and Fine Surfaces

混沌理论在精密精细曲面设计中的应用

基本信息

批准号：
10650127
负责人：
HIGUCHI Masahiro
金额：
$ 1.86万
依托单位：
Kansai University
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (C)
财政年份：
1998
资助国家：
日本
起止时间：
1998 至 1999
项目状态：
已结题

项目摘要

1. Chaotic Characteristics of Mirror-Finished Surface Produced by Ultra-Precision TurningMirror-like surfaces obtained by the ultra-precision turning using diamond tools are smooth to the eye, but rough under a microscope. Although a lot of work has been done on the roughness of the mirror-finished surface, its inhomogeneous static structure is not yet well analyzed. This has led to attempt to discuss quantitatively whether the surface texture was indeed chaotic or not. In this study, the trajectory on the attractor reconstructed in phase space from a measured surface profile was characterized by the Lyapunov exponent and the finite correlation dimension and hence it has the chaotic characteristics. Further, the mirror-finished surface produced by the ultra-precision turning becomes more chaotic as the feed rate and the cutting speed decrease.2. Fractal Characteristics of Si Surface Produced by Anisotropic EtchingThe roughness of Si (100) surfaces etched in aqueous KOH, especially the roughness of the surface with low or no micropyramid formations, was studied using fractal analysis. The etched surfaces exhibited the fractal characteristics, and their fractal dimensions and their root-mean square roughness were found to be dependent on the etching time and the temperature. The simulation of the surface growth using noise reduced Eden model proved that the selective dissolution of Si atoms by random attacks of HィイD22ィエD2O and OH on the Si-Si bond caused the roughening phenomenon that was observed experimentally.

1.超精密车削镜面的混沌特性用金刚石工具进行超精密车削得到的镜面，肉眼看起来很光滑，但在显微镜下看起来很粗糙。虽然人们对镜面加工表面的粗糙度做了大量的工作，但对镜面抛光后表面的不均匀静态结构还没有很好的分析。这导致了试图定量地讨论表面纹理是否确实是混乱的。在本研究中，用Lyapunov指数和有限关联维来表征由测量表面轮廓在相空间中重构的吸引子上的轨迹，因此它具有混沌特性。此外，随着进给速度和切割速度的降低，超精密车削产生的镜面抛光表面变得更加混乱。各向异性刻蚀产生的硅表面的分形特征用分形学方法研究了在KOH溶液中刻蚀的硅(100)表面的粗糙度，特别是具有低或无微锥体的表面的粗糙度。刻蚀表面呈现出分形特征，其分维和均方根粗糙度与刻蚀时间和温度有关。用噪声降低的EDEN模型对表面生长的模拟表明，H、ィイ、D22、ィエ、D2O和OH对Si-Si键的随机攻击导致了Si原子的选择性溶解，导致了实验观察到的表面粗化现象。