Electron impact decomposition process and electron transport property in organic silicon compound

有机硅化合物的电子碰撞分解过程及电子传输特性

• 批准号: 11680476
• 负责人: YOSHIDA Kosaku
• 金额: $ 2.05万
• 依托单位: Kitami Institute of Technology
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 1999
• 资助国家: 日本
• 起止时间: 1999 至 2000
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-11680476/
• 关键词: organic silicon compound; tetramethylsilane; electron swarm parameter; ionisation coefficient; electron drift velocity; electron diffusion coefficient; arrival-time spectra analysis; drift-tube; ATS; 電子シャッター法

A double-shutter drift tube experiment based on the arrival-time spectra theory has been performed to determine four coefficients, namely the ionisation coefficient α/N, the mean arrival-time electron drift velocity W_m, the product of the electron longitudinal diffusion coefficient and the gas density ND_L and the characteristic energy D_L/μ in tetramethylsilane vapor (TMS, Si(CH_3)_4) and tetramethylsilane/hydrogen (TMS/H_2) mixture. Such coefficients are very important for plasma analysis and plasma control in the plasma application field as well as for determination of electron impact cross sections. TMS vapor and TMS/H_2 mixture are widely used in the field such as plasma-enhanced chemical vapor deposition and plasma polymerisation. In the present work, values of the coefficients were determined for the first time in a wide E/N range of 30-5000Td (1Td=10^<-21>Vm^2), E being the electric field and N the gas density. Remarks are as follows ;1. Values of the α/N in the TMS almost coi … More ncide with those in monosilane (SiH_4).2. The α/N in the TMS/H_2 mixture takes maximum at certain mixture ratios in a range of E/N =400-1800Td.3. The W_m in the TMS/H_2 mixture almost obeys Blanc's law.4. The D_L/μ in the TMS/H_2 mixture sensitively changes depending on the H_2 mixture ratio.A steady-state experiment has been also conducted to check the coefficient α/N obtained in the drift tube experiment5. The α/N obtained from both experiments are in good agreement, which suggests validity of the present experiments and the present values of the α/N.6. Electron attachment in the TMS is negligible small.Dissociation of the TMS by electron impact was also investigated by using a quadrupole mass spectrometer (QMS).7. The TMS molecule impacted by an electron beam in the QMS is decomposed to some groups with molecules which methyl radical is detached by ones from the TMS.8. The mass spectrum obtained by the electron beam in the QMS differs from that produced by a TMS/Ar plasma9. Decomposition of the TMS vapor in both the drift tube and the steady-state experiments is negligible.Now, publication of these results as papers is in course of preparation. Less

本文用双快门漂移管实验测定了四甲基硅烷蒸气的电离系数α/N、平均到达时间电子漂移速度W_m、电子纵向扩散系数与气体密度的乘积ND_L和特征能量D_L/μ（TMS，Si（CH_3）_4）和四甲基硅烷/氢（TMS/H_2）混合物。这些系数对于等离子体应用领域中的等离子体分析和等离子体控制以及电子碰撞截面的测定都是非常重要的。TMS蒸气和TMS/H_2混合气体在等离子体增强化学气相沉积和等离子体聚合等领域有着广泛的应用。在本工作中，首次在30- 5000 Td（1 Td =10^Vm ^2）的宽E/N范围内确定了系数值<-21>，E为电场，N为气体密度。备注如下：1. TMS中的α/N值几乎与TMS中的α/N值一致。 ...更多信息 与甲硅烷（SiH_4）中的化合物进行了比较。TMS/H_2混合物的α/N在E/N =400- 1800 Td范围内，在一定的混合比下出现最大值。TMS/H_2混合物中的W_m几乎服从Blanc定律. TMS/H_2混合气体中的D_L/μ随H_2混合比的变化而变化，并对漂移管实验中得到的α/N系数进行了稳态实验验证。从两个实验中得到的α/N是很好的一致性，这表明本实验的有效性和α/N的当前值。TMS中的电子附着量很小，可以忽略不计，利用四极质谱仪（QMS）研究了TMS的电子碰撞解离. TMS分子在QMS中受到电子束的撞击，分解成一些带有分子的基团，其中甲基自由基被TMS中的分子脱离.通过QMS中的电子束获得的质谱不同于通过TMS/Ar等离子体产生的质谱9。在漂移管和稳态实验中，TMS蒸气的分解可以忽略不计。现在，这些结果正在准备以论文的形式发表。少