Improved Gas Barrier Properties of PET Fillms by SiOx deposition

通过 SiOx 沉积改善 PET 填料的气体阻隔性能

• 批准号: 06555192
• 负责人: INAGAKI Norihiro
• 金额: $ 6.98万
• 依托单位: Shizuoka University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (A)
• 财政年份: 1994
• 资助国家: 日本
• 起止时间: 1994 至 1996
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-06555192/
• 关键词: SiOx; Gas barrier; PET film; Packaging material; Plasma Polymerization; Oxygen permeability; Tetramethylsilane; Tetramethoxysilane; 酸素透過量; ポリエステルフィルム; シラン化合物; XPSスペクトル

The project named "Improved Gas Barrier Properties of PET Films by SiOx Deposition" was conducted to improve gas barrier properties of PET film used for food packing materials. The SiOx deposition by plasma polymerization of organic silicone compounds was applied for the improvement. Main results are summerized as follows,1.SiOx films could be formed by the plasma polymerization of mixtures of tetramethylsilane (TMS) or tetramethoxysilane (TMOS) and oxygen.2.Mixing of oxygen, when TMS and TMOS were polymerized, contributed the formation of SiOx films.3.Remote oxygen plasma accelerated the degradation of alkyl groups in TMS and TMOS effectively to deposite SiOx.4.The mixture of TMOS and oxygen of 60 mol% was a preferable raw material for preparation of SiOx film by plasma polymerization.The SiOx deposition on PET film showed powerful improvement of gas barrier properties. Oxygen pearmeation rate from the PET film (80nm SiOx thickness) was 14cm^3/m^2-day-atm, which is four times lower than the original PET film without SiOx deposition.

该项目名为“通过SiOx沉积改善PET薄膜的气体阻隔性能”，旨在改善用于食品包装材料的PET薄膜的气体阻隔性能。通过有机硅化合物的等离子体聚合的SiOx沉积被应用于改进。主要研究结果如下：1.四甲基硅烷（TMS）或四甲氧基硅烷（TMOS）与氧气的混合物可以通过等离子体聚合形成SiOx薄膜; 2.氧气的混合，当TMS和TMOS聚合时，远程氧等离子体能有效地促进TMS和TMOS中烷基的降解，从而沉积出SiO_2薄膜是等离子体聚合法制备SiOx薄膜的较好原料，在PET薄膜上沉积SiOx薄膜，可有效提高薄膜的阻气性。从PET膜（80 nm SiOx厚度）的氧渗透速率为14cm^3/m^2·day-atm，这比没有SiOx沉积的原始PET膜低四倍。

项目成果

N.Inagaki, S.Tasaka, and Y.Ikeda: "Plasma Polymerization of Copper Phthalocyanines and Application of the Plasma Polymer Films to NO2 Gas Sensor Device" J.Appl.Polym.Sci.55. 1451-1464 (1995)

N.Inagaki、S.Tasaka 和 Y.Ikeda：“铜酞菁的等离子体聚合以及等离子体聚合物薄膜在 NO2 气体传感器装置中的应用”J.Appl.Polym.Sci.55。

N. Inagaki,S. Tasaka,Y. Sei: "Plasma Polymer Thin films of Zinc Phthalocyanies for NO2 Gas Sensor Device," Polymer Bulletine. 36. 601-607 (1996)

N.稻垣，S。

N.Inagaki, S.Tasaka, H.Ohmori, and S.Mibu: "Improvement in the Adhesion between Copper Metal and Polyimide Substrate by Plasma Polymer Deposition of Cyano Compounds onto Polyimide" J.Adhesion Sci.Technol.10. 243-256 (1996)

N.Inagaki、S.Tasaka、H.Ohmori 和 S.Mibu：“通过将氰基化合物等离子聚合物沉积到聚酰亚胺上来改善铜金属和聚酰亚胺基材之间的粘合力”J.Adhesion Sci.Technol.10。

N.Inagaki, S.Tasaka, and Y.Sei: "Plasma Polymer Thin films of Zinc Phthalocyanies for NO2 Gas Sensor Device" Polym.Bull. 36. 601-607 (1996)

N.Inagaki、S.Tasaka 和 Y.Sei：“用于二氧化氮气体传感器装置的锌酞菁等离子体聚合物薄膜”Polym.Bull。

Y.Yamada,I.Yamada,S.Tasaka,N.Inagaki: "Surface Modification of Poly(tetrafluorocthylene) by Remote Hydrogen Plsama" Macromolecues. 29. 4331-4339 (1996)

Y.Yamada，I.Yamada，S.Tasaka，N.Inagaki：“通过远程氢等离子体对聚（四氟乙烯）进行表面改性”大分子。