Improved Gas Barrier Properties of PET Fillms by SiOx deposition

该项目名为“通过SiOx沉积改善PET薄膜的气体阻隔性能”，旨在改善用于食品包装材料的PET薄膜的气体阻隔性能。通过有机硅化合物的等离子体聚合的SiOx沉积被应用于改进。主要研究结果如下：1.四甲基硅烷（TMS）或四甲氧基硅烷（TMOS）与氧气的混合物可以通过等离子体聚合形成SiOx薄膜; 2.氧气的混合，当TMS和TMOS聚合时，远程氧等离子体能有效地促进TMS和TMOS中烷基的降解，从而沉积出SiO_2薄膜是等离子体聚合法制备SiOx薄膜的较好原料，在PET薄膜上沉积SiOx薄膜，可有效提高薄膜的阻气性。从PET膜（80 nm SiOx厚度）的氧渗透速率为14cm^3/m^2·day-atm，这比没有SiOx沉积的原始PET膜低四倍。

The project named "Improved Gas Barrier Properties of PET Films by SiOx Deposition" was conducted to improve gas barrier properties of PET film used for food packing materials. The SiOx deposition by plasma polymerization of organic silicone compounds was applied for the improvement. Main results are summerized as follows,1.SiOx films could be formed by the plasma polymerization of mixtures of tetramethylsilane (TMS) or tetramethoxysilane (TMOS) and oxygen.2.Mixing of oxygen, when TMS and TMOS were polymerized, contributed the formation of SiOx films.3.Remote oxygen plasma accelerated the degradation of alkyl groups in TMS and TMOS effectively to deposite SiOx.4.The mixture of TMOS and oxygen of 60 mol% was a preferable raw material for preparation of SiOx film by plasma polymerization.The SiOx deposition on PET film showed powerful improvement of gas barrier properties. Oxygen pearmeation rate from the PET film (80nm SiOx thickness) was 14cm^3/m^2-day-atm, which is four times lower than the original PET film without SiOx deposition.