PROPOSAL OF SIMPLE FABRICATION TECHNIQUE OF NONLINEAR OPTICAL WAVEGUIDE DEVICES BASED ON NANOIMPRINT LITHOGRAPHY

基于纳米压印光刻的非线性光波导器件简单制作技术的提出

• 批准号: 12650341
• 负责人: SUGIHARA Okihiro
• 金额: $ 1.86万
• 依托单位: SHIZUOKA UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 2000
• 资助国家: 日本
• 起止时间: 2000 至 2001
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-12650341/
• 关键词: NANOIMPRINT; HOT EMBOSS; ELECTROOPTIC POLYMER; MASTER; REPLICA; GRATING; WAVEGUIDE; MASK; ホットエンボス; ナノインプリント法; マスター回折格子; レプリカ回折格子; SHG回折; 熱安定性; 機械的安定性; チャネル導波路

Simple fabrication technique of nonlinear gratings and waveguides in polymer films based-on nanoimprint technology was proposed and demonstrated. The grating master consisting of metal base and polyimide die was fabricated by the single pulse two-beam interference technique using UV laser ablation, and its thermal and mechanical stability was investigated. The master molded electrooptic polymers at around their glass transition temperatures. At the same time, high voltage was applied to the polymer films to induce the second-order nonlinearity. The grating profile, stability and the nonlinearity were measured. Moreover, fabrication of channel waveguide was realized based on the present hot-emboss technique combined with UV photobleaching. The several advantages of this technique, in a high resolutional and simple way, make it useful for several polymer waveguide devices for electrooptic modulation and frequency conversion.

提出并论证了一种基于纳米压印技术的聚合物薄膜中非线性光栅和光波导的简易制作技术。采用紫外单脉冲双光束干涉技术制作了由金属基片和聚酰亚胺芯片组成的光栅片，并对其热稳定性和机械稳定性进行了研究。母版在大约玻璃化转变温度下模压电光聚合物。同时，对聚合物薄膜施加高压，使其产生二阶非线性。测量了光栅的轮廓、稳定性和非线性。此外，基于目前的热压工艺和紫外光漂白技术，实现了沟道光波导的制作。该技术具有分辨率高、方法简单等优点，可用于多种聚合物光波导器件的电光调制和频率变换。

项目成果

M. Nakanishi, H. Yamaji, O. Sugihara, H. Fujimura, C. Egami, N. Okamoto: "Simple Fabrication of Nonlinear Gratings in Polymer Film by Simultaneous Process of Emboss Heating and Thermal Poling"Mol. Cryst. Liq. Cryst.. Vol.349. 15-18 (2000)

M. Nakanishi、H. Yamaji、O. Sugihara、H. Fujimura、C. Egami、N. Okamoto：“通过浮雕加热和热极化同时工艺在聚合物薄膜中简单制作非线性光栅”Mol。

杉原興浩,車彦龍,柴田慎弥,岡本尚道: "高温圧着ポーリング法による非線形高分子光導波路部品の形成"第49回高分子討論会. IL16(依頼発表). (2000)

Yoshihiro Sugihara、Ryu Kurumahiko、Shinya Shibata、Naomichi Okamoto：“通过高温压力极化方法形成非线性聚合物光波导元件”第 49 届聚合物研讨会 IL16（特邀报告）。

杉原興浩: "高分子光回路の研究---材料、成形加工、実装の動向と課題"フォトニクス・フォーラム・ニューズレター. Vol.21. 3-9 (2001)

Yoshihiro Sugihara：“聚合物光学电路的研究——材料、成型和封装的趋势和问题”光子学论坛通讯第 21 卷 3-9 (2001)。

O.Sugihara,Y.Che,S.Shibata,H.Fujimura,C.Egami,N.Okamoto: "Nonlinear Grating Formation Based-on Nanoimprint Technology : Fabrication and Characteristics of Master Gratings"Korea-Japan Joint Forum 2000. O-14. 31 (2000)

O.Sugihara,Y.Che,S.Shibata,H.Fujimura,C.Egami,N.Okamoto：“基于纳米压印技术的非线性光栅形成：主光栅的制作和特性”韩日联合论坛2000。O-

O.Sugihara,Y.Che,S.Shibata,M.Nakanishi,H.Yamaji,H.Fujimura,C.Egami,N.Okamoto: "Polymeric optical waveguide components fabricated by simultaneous process of embossing and poling at elevated temperatures"SPIE Photonics West. 4279-2. (2000)

O.Sugihara,Y.Che,S.Shibata,M.Nakanishi,H.Yamaji,H.Fujimura,C.Egami,N.Okamoto：“在高温下同时进行压花和极化工艺制造的聚合物光波导元件”SPIE