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Switching rate and power capacity improvement of semiconductor power device by effect of magnetic fields

Switching rate and power capacity improvement of semiconductor power device by effect of magnetic fields
磁场效应提高半导体功率器件的开关速率和功率容量
批准号:
13355012
负责人:
ISHII Hozo
金额:
$21.55万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (A)
财政年份:
2001
资助国家:
日本
项目状态:
已结题
起止时间:
2001 至 2002

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中文摘要
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英文摘要
The influence of magnetic fields on carrier behavior in power semiconductor devices was examined in order to obtain technical data required for designing devices that can switch in high-current density region with high di/dt characteristics for pulsed power applications. Free carrier absorption method using the infrared probe laser with wavelength of 1.55μm was employed to measure spatial and temporal change in carrier distribution of a pin-diode, which has a basic structure of power semiconductor devices. The probe laser beam ray was analyzed and spatial resolution of 40μm was obtained. Spatial nonuniformity of the carrier density caused by Lorentz force was successfully observed. The factor contributed to the increase of on-resistance by the magnetic field was discussed. The spatial nonuniformity of the carrier density distribution led to the decrease of the effective cross section of the current in the device. As actually utilized power device, a SI-thyristor, which attracted much attention as a possible candidate for a fast switching device in pulsed power technology, was adopted to examine the carrier behavior. The carrier in the semiconductor power devices works to remove the potential barrier and to transfer electric charges from the anode to the cathode. The amount of carrier involved in transferring the electric charge was comparatively small for the fast pulse switching, even if the current density was considerably high. In this research, the possibility of improving the turn-off characteristics and establishing high-repetition operation of the SI-thyristor was confirmed.
期刊论文(20)
专著(0)
科研奖励(0)
会议论文
青木 喬: "パルスパワー動作時におけるSIサイリスタ構造内のキャリア分布測定"電気学会プラズマ研究会資料. PST-02-135. 25-30 (2002)
Takashi Aoki:“脉冲功率操作期间 SI 晶闸管结构中的载流子分布的测量”IEEJ 等离子体研究组材料。
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青木 喬: "パルス大電力動作時の半導体パワーデバイスに与える磁界の効果"電気学会プラズマ研究会資料. PST-02-15. (2002)
Takashi Aoki:“脉冲高功率运行期间磁场对半导体功率器件的影响”IEEJ 等离子体研究组材料 (2002)。
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通讯作者:
Shozo Ishii: "Pulsed Power Application assisted by Power Semiconductor Devices"The 13th International Symposium on Power Semiconductor Devices & ICs. 11-14 (2001)
石井正三:“功率半导体器件辅助的脉冲功率应用”第十三届国际功率半导体器件研讨会
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K.Yasuoka: "A STUDY OF TRANSIENT CARRIER MESUREMENTS IN PIN POWER DIODES BY INFRARED LASER PROBING"Proceedings of National Institute for Fusion Science(NIFS). NIFS-PROC-50. 101-108 (2002)
K.Yasuoka:“通过红外激光探测对 PIN 功率二极管中的瞬态载流子测量进行研究”国家融合科学研究所 (NIFS) 论文集。
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