Preparation of highly corrosion-resistant compositionally graded coatings using multi-ion vapor deposition system

多离子气相沉积系统制备高耐腐蚀成分梯度涂层

• 批准号: 13650772
• 负责人: KAWASHIMA Asahi
• 金额: $ 2.3万
• 依托单位: TOHOKU UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 2001
• 资助国家: 日本
• 起止时间: 2001 至 2002
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-13650772/
• 关键词: Cr-Ta alloy coating; compositionally graded coating; sputter deposition; dynamic ion beam mixing; pinhole defect density; corrosion resistance; イオンミキシング; CrTa合金被覆

An attempt was made to tailor thin film coatings with a low pinhole defect density by dynamic ion beam mixing (DM) method using multi-ion vapor deposition system. The Cr-Ta binary alloy and the compositionally graded (CrTa-type 304 stainless steel) alloy thin films were sputter-deposited on a type 304 stainless steel (304SS) substrate. The following conclusions were drawn ;(1) The pinhole defect density (R) depends largely on the surface finishing of the substrate.(2) R value for the Cr-Ta coated 304SS decreases with an increase in the film thickness. The lowest R value was obtained for the film of 5 μm in thickness, and is 5x10^<-5>%, Which is about one order of magnitude lower than that for TiN coated 304SS.(3) An increase in acceleration voltage of Freeman Type argon ion source up to 30 kV leads to decrease in R value. Accordingly, DM is quite effective method in enhancing the corrosion resistance of thin film coatings.(4) TEM observation revealed that the Cr-Ta alloy thin films prepared by DM consist of a mixture of bcc microcrystalline Ta in the amorphous matrix, although they are considered to be amorphous single phase by XRD. Furthermore, bubble-shaped particles were observed in the films and in substrate surface in contact with the film. The diameter of the particle is in the range of 2-10 nm.(5) The compositionally graded (CrTa-304SS) thin film coatings shows higher R value compared with the Cr-Ta binary alloy coatings. This may be responsible for significant increase in surface roughness by crystal growth of 304SS layer during deposition.

利用多离子气相沉积系统，采用动态离子束混合（DM）方法制备了具有低针孔缺陷密度的薄膜。在304不锈钢（304 SS）衬底上沉积了Cr-Ta二元合金和成分梯度（CrTa型304不锈钢）合金薄膜。得出以下结论：（1）针孔缺陷密度（R）在很大程度上取决于基板的表面光洁度。(2)Cr-Ta涂层304不锈钢的R值随膜厚的增加而减小。在5 μm厚的膜层中，R值最低，为5 × 10 ~（-1）<-5>%，比TiN涂层的304不锈钢低一个数量级。(3)Freeman型氩离子源加速电压提高到30 kV时，R值下降。因此，DM是提高薄膜涂层耐蚀性的有效方法。(4)TEM观察表明，DM法制备的Cr-Ta合金薄膜由体心立方结构的微晶Ta和非晶基体组成，而XRD分析表明其为单相非晶。此外，在膜中和与膜接触的基底表面中观察到气泡状颗粒。颗粒的直径在2-10 nm的范围内。(5)与Cr-Ta二元合金涂层相比，成分梯度（CrTa-304 SS）薄膜涂层显示出更高的R值。这可能是由于沉积过程中304 SS层的晶体生长导致表面粗糙度显著增加的原因。

项目成果

A.Kawashima: "XPS and Electrochemical Studies of Amorphous Ni-Nb-Ta-P Alloys in 12 M HCl"Corrosion Science and Technology. 31・6. 438-443 (2002)

A. Kawashima：“12 M HCl 中非晶态 Ni-Nb-Ta-P 合金的 XPS 和电化学研究”腐蚀科学与技术 31・6 (2002)。

A.Kawashima, H.Habazaki, K.Hashimoto: "Highly corrosion-resistant amorphous Ni-based amorphous alloys"Mater. Sci. Eng.. A304-306. 753-757 (2001)

A.Kawashima，H.Habazaki，K.Hashimoto：“高耐腐蚀非晶镍基非晶合金”Mater。

A. Kawashima, T. Sato and K. Asami: "XPS and Electrochemical Studies of amorphous Ni-Nb-Ta-p Alloys in 12M HCI"Corrosion Science and Technology. 31. 438-443 (2002)

A. Kawashima、T. Sato 和 K. Asami：“12M HCI 中非晶态 Ni-Nb-Ta-p 合金的 XPS 和电化学研究”腐蚀科学与技术。

Hiroki Habazaki, Tetsuo Matsui, Asahi Kawashima, Katsuhiko Asami Naokazu, Kumagai, Koji Hashimoto: "Nanaocrystalline manganese-molybdenum-tungsten oxide anodes for oxygen evolution in seawater analysis"Scripta Mater.. 44. 1659-1662 (2001)

Hiroki Habazaki、Tetsuo Matsui、Asahi Kawashima、Katsuhiko Asami Naokazu、Kumagai、Koji Hashimoto：“用于海水分析中析氧的纳米晶锰-钼-钨氧化物阳极”Scripta Mater.. 44. 1659-1662 (2001)

H.Habazaki, T.Sato, A.Kawashima, K.Hashimoto: "Preparation of corrosion-resistant amorphous Ni-Cr-P-B bulk alloys containing molybdenum and tantalum"Mater. Sci. Eng... A304-306. 696-700 (2001)

H.Habazaki、T.Sato、A.Kawashima、K.Hashimoto：“含钼和钽的耐腐蚀非晶态 Ni-Cr-P-B 块体合金的制备”。