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Study of the Surface Treatment of a Capillary Inner-Wall using RF excited Microplasmas

射频激发微等离子体对毛细管内壁表面处理的研究

基本信息

批准号：
13650791
负责人：
YOSHIKI Hiroyuki
金额：
$ 2.3万
依托单位：
Tsuruoka National College of Technology
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (C)
财政年份：
2001
资助国家：
日本
起止时间：
2001 至 2003
项目状态：
已结题

项目摘要

RF excited microplasma generation system, which generates atmospheric-pressure He and Ar microplasma in a capillary with a cross section of 150×500 μm^2 on a quartz chip 2 cm square of a thickness of 1 mm at a low-power of less than 10 W, has been developed. It's a portable plasma source with a weight of about 5 kg. The atomic excitation temperature of He and Ar plasmas were estimated by an optical emission spectroscopic to be 2000-2500 K and 5000 K, respectively. The microplasma was applied to inner-wall modification and SiO_2 thin films coating on a poly(ethylene terephthalate) (PET) capillary with an inner diameter of φ0.5 mm to demonstrate the electro-osmosis flow (EOF) control. Furthermore, the microplasma was also applied to inner-wall treatment of a poly(tetrafluoroethylene) (PTFE) tube of φ1×0.5 mm to cause the wettability. The maximum wettability was obtained at a gas flow rate of 200 ml/min and a treatment time of 15 s. X-ray spectroscopy (XPS) of the plasma treated PTFE inner-wall revealed an O1s peak corresponding to the C=0 group. Scanning electron microscope (SEM) image showed that the plasma treated inner-wall is smoothed due to the etching effect.Moreover, an atmospheric-pressure microplasma jet (μ-PJ) using a steel surgical needle with an outer diameter of less than 0.5 mm has been developed. The O_2 μ-PJ was applied a localized removal of a photoresist films. Furthermore, the localized Si etching was also examined using the He/SF_6/O_2 μ-PJ and the etching rate of 170 μm/min was attained.

研制了一套射频激励微等离子体发生系统，该系统在厚度为1 mm、2 cm见方的石英芯片上、截面积为150×500 μm^2的毛细管中，以小于10 W的低功率产生大气压下的He和Ar微等离子体。这是一个便携式等离子体源，重量约为5公斤。用发射光谱法估算了He和Ar等离子体的原子激发温度分别为2000-2500 K和5000 K。将微等离子体应用于内径为φ 0.5mm的聚对苯二甲酸乙二酯（PET）毛细管的内壁改性和SiO2薄膜涂覆，以实现电渗流控制。此外，还将微等离子体应用于φ1× 0.5mm的聚四氟乙烯（PTFE）管的内壁处理，以产生润湿性。当气体流量为200 ml/min，处理时间为15 s时，膜的润湿性最好。经等离子体处理的PTFE内壁的X射线光谱（XPS）揭示了对应于C=0组的O 1 s峰。扫描电子显微镜（SEM）图像显示，等离子体处理后的内壁由于刻蚀作用而变得光滑。此外，我们还研制了一种大气压微等离子体射流（μ-PJ），该射流使用外径小于0.5mm的钢制手术针。将O_2 μ-PJ应用于光刻胶膜的局部去除。此外，还研究了He/SF_6/O_2 μ-PJ对Si的局域刻蚀，刻蚀速率达到170 μm/min。