Clustering reaction control in plasma CVD for fabricating high efficiency solar cells

用于制造高效太阳能电池的等离子体 CVD 中的团簇反应控制

• 批准号: 14205047
• 负责人: YUKIO Watanabe
• 金额: $ 34.61万
• 依托单位: KYUSHU UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (A)
• 财政年份: 2002
• 资助国家: 日本
• 起止时间: 2002 至 2004
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-14205047/
• 关键词: amorphous silicon; clustering reaction control in plasma CVD; silicon particle; thin film solar cell; light induced degradation; cluster eliminating filter; multi-hollow discharge; higher order silane; Si-H結合; Si-H_2結合; 高周波放電; 太陽電池; 微細構造パラメータ

We have developed clustering reaction control in plasma CVD for fabricating high efficiency a-Si:H solar cells. Following results are obtained in this study.1.We have developed a filter for eliminating cluster contribution to films. We have suppressed the contribution to films 1/100 times as low as that to conventional device quality films.2.We have succeeded in depositing a-Si:H films which show little light induced defects by using the filter together with a cluster-suppressed plasma CVD.3.We have developed multi-hollow discharges for realizing cluster-free a-Si:H.4.We have succeeded in fabricating a Ni/a-Si:H/n^+ c-Si Schottkey cell which has a littile light induced degradation of 4%.These results indicates that suppression of contribution of clusters to films is the key to stable high efficiency a-Si:H solar cell.

我们发展了等离子体化学气相沉积（CVD）中的团簇反应控制技术，用于制备高效率的a-Si：H太阳电池。本研究得到以下结果：1.我们发展了一种滤除团簇对薄膜贡献的滤波器。我们成功地制备出了无团簇的a-Si：H薄膜。4.我们成功地制备出了Ni/a-Si：H/n^+ c-Si肖特基电池，其光致退化率为4%。这些结果表明，抑制团簇对薄膜的贡献是获得稳定高效a-Si：H太阳电池的关键。

项目成果

Correlation between volume fraction of clusters incorporated into a-Si:H films and hydrogen content associated with Si-H_2 bonds in the films

a-Si:H薄膜中团簇的体积分数与薄膜中Si-H_2键相关的氢含量之间的相关性

• 发表时间: 2004
• 期刊: Journal of Vacuum Science and Technology A 22・4
• 作者: Kazunori Koga;Naoto Kaguchi;Masaharu Shiratani;Yukio Watanabe
• 通讯作者: Yukio Watanabe

白谷 正治, 古閑 一憲, 渡辺 征夫: "ナノクラスタ制御ブラズマCVDと高品質,光安定 a-Si : H 太陽電池への応用"アモルファスセミナーテキスト. 95-100 (2002)

Masaharu Shiratani、Kazunori Koga、Yukio Watanabe：“纳米团簇控制等离子体 CVD 及其在高质量、光稳定的 a-Si:H 太阳能电池中的应用”非晶研讨会文本 95-100 (2002)。

M.Shiratani, K.Koga, A.Harikai, T.Ogata, Y.Watanabe: "Effects of Excitation Frequency and H_2 Dilution on Cluster Generation in Silane High-Frequency Discharge"MRS Symp Proc.. 762. A9.5.1-A9.5.6 (2003)

M.Shiratani、K.Koga、A.Harikai、T.Ogata、Y.Watanabe：“激发频率和 H_2 稀释对硅烷高频放电中团簇生成的影响”MRS Symp Proc.. 762. A9.5.1-A9

M.Ito, N.Myojin, M.Kondo, A.Matsuda, M.Shiratani, Y.Watanabe: "Light-soaking stability of nano-structure tailored silicon thin film solar cells"Proc.3rd World Conference on Photovoltaic Energy Conversion. SO-D14-02 (2003)

M.Ito、N.Myojin、M.Kondo、A.Matsuda、M.Shiratani、Y.Watanabe：“纳米结构定制硅薄膜太阳能电池的光浸稳定性”Proc.第三届世界光伏能源转换会议。

Species responsible for Si-H_2 bond formation in a-Si:H films deposited using silane high frequency discharges

使用硅烷高频放电沉积的 a-Si:H 薄膜中负责形成 Si-H_2 键的物质

• 发表时间: 2005
• 期刊: Thin Solid Films (in press)
• 作者: Masaharu Shiratani;Kazunori Koga;Naoto Kaguchi;Kouki Bando;Yukio Watanabe
• 通讯作者: Yukio Watanabe