Clustering reaction control in plasma CVD for fabricating high efficiency solar cells
Clustering reaction control in plasma CVD for fabricating high efficiency solar cells
批准号:
14205047
负责人:
YUKIO Watanabe
金额:
$34.61万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (A)
财政年份:
2002
资助国家:
日本
项目状态:
已结题
起止时间:
2002 至 2004
中文摘要
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英文摘要
We have developed clustering reaction control in plasma CVD for fabricating high efficiency a-Si:H solar cells. Following results are obtained in this study.1.We have developed a filter for eliminating cluster contribution to films. We have suppressed the contribution to films 1/100 times as low as that to conventional device quality films.2.We have succeeded in depositing a-Si:H films which show little light induced defects by using the filter together with a cluster-suppressed plasma CVD.3.We have developed multi-hollow discharges for realizing cluster-free a-Si:H.4.We have succeeded in fabricating a Ni/a-Si:H/n^+ c-Si Schottkey cell which has a littile light induced degradation of 4%.These results indicates that suppression of contribution of clusters to films is the key to stable high efficiency a-Si:H solar cell.
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Correlation between volume fraction of clusters incorporated into a-Si:H films and hydrogen content associated with Si-H_2 bonds in the films
a-Si:H薄膜中团簇的体积分数与薄膜中Si-H_2键相关的氢含量之间的相关性
DOI:
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发表时间:
2004
期刊:
Journal of Vacuum Science and Technology A 22・4
影响因子:
--
作者:
[Kazunori Koga, Naoto Kaguchi, Masaharu Shiratani, Yukio Watanabe]
通讯作者:
Yukio Watanabe
白谷 正治, 古閑 一憲, 渡辺 征夫: "ナノクラスタ制御ブラズマCVDと高品質,光安定 a-Si : H 太陽電池への応用"アモルファスセミナーテキスト. 95-100 (2002)
Masaharu Shiratani、Kazunori Koga、Yukio Watanabe:“纳米团簇控制等离子体 CVD 及其在高质量、光稳定的 a-Si:H 太阳能电池中的应用”非晶研讨会文本 95-100 (2002)。
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M.Shiratani, K.Koga, A.Harikai, T.Ogata, Y.Watanabe: "Effects of Excitation Frequency and H_2 Dilution on Cluster Generation in Silane High-Frequency Discharge"MRS Symp Proc.. 762. A9.5.1-A9.5.6 (2003)
M.Shiratani、K.Koga、A.Harikai、T.Ogata、Y.Watanabe:“激发频率和 H_2 稀释对硅烷高频放电中团簇生成的影响”MRS Symp Proc.. 762. A9.5.1-A9
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M.Ito, N.Myojin, M.Kondo, A.Matsuda, M.Shiratani, Y.Watanabe: "Light-soaking stability of nano-structure tailored silicon thin film solar cells"Proc.3rd World Conference on Photovoltaic Energy Conversion. SO-D14-02 (2003)
M.Ito、N.Myojin、M.Kondo、A.Matsuda、M.Shiratani、Y.Watanabe:“纳米结构定制硅薄膜太阳能电池的光浸稳定性”Proc.第三届世界光伏能源转换会议。
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Species responsible for Si-H_2 bond formation in a-Si:H films deposited using silane high frequency discharges
使用硅烷高频放电沉积的 a-Si:H 薄膜中负责形成 Si-H_2 键的物质
DOI:
--
发表时间:
2005
期刊:
Thin Solid Films (in press)
影响因子:
--
作者:
[Masaharu Shiratani, Kazunori Koga, Naoto Kaguchi, Kouki Bando, Yukio Watanabe]
通讯作者:
Yukio Watanabe
共 12 条
Formation of atomically flat clean surface of ferroelectric and the investigation of the properties of the surface
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批准号:19340084
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$12.23万
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财政年份:2007
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负责人:YUKIO Watanabe
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依托单位: