权益分类	功能权益	普通用户	{{item.name}}会员
{{category.name}}	{{benefitItem.name}}

Synthesis of near future electromagnetic noise suppressor with nano-granular structure and their application to electric devices.

近期纳米颗粒结构电磁噪声抑制器的合成及其在电子设备中的应用。

基本信息

批准号：
16360351
负责人：
OHNUMA Shigehiro
金额：
$ 9.41万
依托单位：
Research Institute for Electric and Magnetic Materials (RIEMM)
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (B)
财政年份：
2004
资助国家：
日本
起止时间：
2004 至 2006
项目状态：
已结题

项目摘要

1. Investigation of electromagnetic noise suppressor at GHz range : Nano-granular soft magnetic films with different electric resistivity were investigated to find the excellent electromagnetic noise suppressor at GHz band. The noise suppression effect of nano-granular films has been found to originate in two losses, that is, magnetic loss and electric resistive loss (eddy current loss). It is also found that noise suppressor suitable for optional electric devices is realized by combining two losses which is attributed to film compositions.2. Establishment of film deposition method at low temperature : The substrate temperature (Tsub.) increases up to 100 C or more in conventional sputtering deposition, especially, around 300 C in the case of reactive spattering. Such a high temperature of Tsub limits the application field of the film. We have tried to find the deposition method in lower Tsub than 100 C using Facing Targets Sputtering System. Systematically investigating the parameters of sputtering is found to realize Tsub less than 85 C during deposition. The new method expands the substrate materials not only Si and glass but also polymer with low phase transformation temperature or electric devices directly.3. Test for practical application : The nano-granular soft magnetic films were sputter-deposited on the surface of LSI by the deposition method shown in 2. We could not find any mechanical or electrical damage in LSI with the deposition. The electromagnetic noise from the surface has been evaluated by a micro magnetic probe method. Considerable amount of noise suppressing is observed in the surface of LSI covered with the films, compared with the result of nude LSI.All the research objectives have been achieved, described above.

1. GHz频段电磁噪声抑制剂的研究：研究了不同电阻率的纳米颗粒软磁薄膜，以寻找GHz频段电磁噪声抑制剂。纳米颗粒膜的噪声抑制效应主要来源于两种损耗，即磁损耗和电阻损耗（涡流损耗）。研究还发现，通过组合薄膜成分引起的两种损耗，可以实现适用于可选电子器件的噪声抑制器.低温成膜方法的建立：衬底温度Tsub.在常规溅射沉积中，温度升高到100 ℃或更高，特别是在反应性溅射的情况下，温度升高到300 ℃左右。如此高的Tsub温度限制了膜的应用领域。我们尝试使用对靶溅射系统在低于100 ℃的Tsub下找到沉积方法。系统地研究了溅射参数，发现在沉积期间实现Tsub小于85 C。新方法使衬底材料不仅限于硅和玻璃，而且还可以直接用于相变温度低的聚合物或电子器件.实际应用测试：采用图2所示的沉积方法在LSI表面沉积纳米颗粒软磁薄膜。我们在LSI中未发现任何机械或电气损坏。用微磁探针法测量了表面的电磁噪声。与裸LSI的结果相比，在覆盖有膜的LSI的表面中观察到相当数量的噪声抑制。