Researches on the atom lithography using the computer-generated holograms

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We developed the fundamental techniques of atom lithography using the computer-generated holograms and the evanescent wave, which is a promising candidate for the novel nanofabrication. We improved the efficiency in generating the ultra-cold atoms for the atom source of lithography. We also developed the light source near a wavelength of 400nm with a violet laser diode. The frequency of the 780nm-light was stabilized less than 0.4MHz for 2 hours with the saturation signal of the rubidium atoms, which is applicable to stabilizing the optical mask in lithography.