Study on fabrication techniques of high performance thin films for future ultrasonic and/or photonic devices

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(1) Luminescence characteristics from silica glass thin films containing periodic doped impurities have been investigated. Capability of the films for optical amplification in short wavelength band around 400nm was clarified. Piezoelectricity similar to quartz crystal was observed in the films with periodic structure, however it almost disappeared after one year. (2) Growth technique of single crystal films of oxides on silica substrate was proposed. Signs of epitaxial growth of oxides on silica were observed. However, reproducibility was not so high. A temperature sensing technique during the crystallization process was developed to improve it.