Analysis of Moving Track of Low Pressure Arc Cathode Spots for Development of High Speed Removing Method of Oxide Layer
低压电弧阴极光斑移动轨迹分析开发高速去除氧化层方法
基本信息
- 批准号:20760188
- 负责人:
- 金额:$ 2.5万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for Young Scientists (B)
- 财政年份:2008
- 资助国家:日本
- 起止时间:2008 至 2010
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
The moving track of low pressure arc cathode spots for development of high speed removing method of oxide layer was elucidated by using the electrode of low pressure arc generation, algorithm of plasma image processing and high speed video camera. As a result, the cathode spot was split and united, repeatedly. In addition, the oxide layer is evaporated and blows up, when the cathode spots contact with the oxide layer and moves at the boundary, continuously. These phenomena were depended by the oxide thickness.
利用低压电弧发生电极、等离子体图像处理算法和高速摄像机,阐明了高速去除氧化层方法中低压电弧阴极斑点的运动轨迹。其结果是,阴极斑点分裂和联合,反复。此外,当阴极斑点与氧化层接触并在边界处连续移动时,氧化层被蒸发并吹胀。这些现象与氧化层厚度有关。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Removal of Oxide Layer on Metal Surface using Cathode Spot in Vacuum Arc for Reuse.
使用真空电弧阴极点去除金属表面的氧化层以供再利用。
- DOI:
- 发表时间:2010
- 期刊:
- 影响因子:0
- 作者:Toru Iwao;Shinya Kamishima;Masashi Namba;Naoko Ogura;Motoshige Yumoto.
- 通讯作者:Motoshige Yumoto.
Relation between surface roughness and number of cathode spots of a low-pressure arc, Plasma Sources Sci.
表面粗糙度与低压电弧阴极点数量之间的关系,Plasma Sources Sci。
- DOI:
- 发表时间:2008
- 期刊:
- 影响因子:0
- 作者:Atsushi Sato;Toru Iwao;Motoshige Yumoto.
- 通讯作者:Motoshige Yumoto.
Movement of Vacuum Arc Cathode Spots on SS400 (Fe+C) Surface with Oxide Layer
具有氧化层的SS400(Fe C)表面真空电弧阴极斑点的移动
- DOI:
- 发表时间:2009
- 期刊:
- 影响因子:0
- 作者:Toru Iwao;Shinya Kamishima;Naoko Ogura;Motoshige Yumoto
- 通讯作者:Motoshige Yumoto
Removal Process of Oxide Layer on Metal Surface using Cathode Spot in Vacuum Arc
真空电弧阴极点去除金属表面氧化层的工艺
- DOI:
- 发表时间:2010
- 期刊:
- 影响因子:0
- 作者:Naoko Ogura;Masashi Nanba;Shinya Kamishima;Toru Iwao;Motoshige Yumoto
- 通讯作者:Motoshige Yumoto
{{
item.title }}
{{ item.translation_title }}
- DOI:
{{ item.doi }} - 发表时间:
{{ item.publish_year }} - 期刊:
- 影响因子:{{ item.factor }}
- 作者:
{{ item.authors }} - 通讯作者:
{{ item.author }}
数据更新时间:{{ journalArticles.updateTime }}
{{ item.title }}
- 作者:
{{ item.author }}
数据更新时间:{{ monograph.updateTime }}
{{ item.title }}
- 作者:
{{ item.author }}
数据更新时间:{{ sciAawards.updateTime }}
{{ item.title }}
- 作者:
{{ item.author }}
数据更新时间:{{ conferencePapers.updateTime }}
{{ item.title }}
- 作者:
{{ item.author }}
数据更新时间:{{ patent.updateTime }}
IWAO Toru其他文献
Resistance Changes of (La, Sr)MnO_3 Thin Film via Exchange Bias Tuning by the Application of an External Electric Field
施加外部电场通过交换偏置调节(La,Sr)MnO_3薄膜的电阻变化
- DOI:
- 发表时间:
2009 - 期刊:
- 影响因子:0
- 作者:
IWAO Toru;KAMISHIMA Shinya;INOM ATA Tsuyoshi;YUMOTO Motoshige;Takeshi Yokota - 通讯作者:
Takeshi Yokota
Relationships between magneto-capacitance-voltage characteristics and magneto-resistance of Au/Cr_2O_3/Cr_2 O_<3-x>/ FeCr/CeO_2/Si MIS capacitor
Au/Cr_2O_3/Cr_2 O_<3-x>/FeCr/CeO_2/Si MIS电容器的磁电容-电压特性与磁阻的关系
- DOI:
- 发表时间:
2009 - 期刊:
- 影响因子:0
- 作者:
IWAO Toru;KAMISHIMA Shinya;INOM ATA Tsuyoshi;YUMOTO Motoshige;Takeshi Yokota;Takeshi Yokota;Takeshi Yokota;Takeshi Yokota;Takeshi Yokota - 通讯作者:
Takeshi Yokota
Influence of an external magnetic field on injected charges of a Cr_2O_3/Fe/CeO_2/Si MIS capacitor
外部磁场对Cr_2O_3/Fe/CeO_2/Si MIS电容器注入电荷的影响
- DOI:
- 发表时间:
2009 - 期刊:
- 影响因子:0
- 作者:
IWAO Toru;KAMISHIMA Shinya;INOM ATA Tsuyoshi;YUMOTO Motoshige;Takeshi Yokota;Takeshi Yokota - 通讯作者:
Takeshi Yokota
Preparation and magnetic properties of SrFeO_<3-x> (x=0.25~0.5) using Radio Frequency magnetron sputtering method optimized by sputtering plasma analyses
溅射分析等离子体优化射频磁控溅射方法制备SrFeO_<3-x>(x=0.25~0.5)及其磁性能
- DOI:
- 发表时间:
2009 - 期刊:
- 影响因子:0
- 作者:
IWAO Toru;KAMISHIMA Shinya;INOM ATA Tsuyoshi;YUMOTO Motoshige;Takeshi Yokota;Takeshi Yokota;Takeshi Yokota - 通讯作者:
Takeshi Yokota
IWAO Toru的其他文献
{{
item.title }}
{{ item.translation_title }}
- DOI:
{{ item.doi }} - 发表时间:
{{ item.publish_year }} - 期刊:
- 影响因子:{{ item.factor }}
- 作者:
{{ item.authors }} - 通讯作者:
{{ item.author }}
{{ truncateString('IWAO Toru', 18)}}的其他基金
Control of Vacuum Arc Cathode Spot Movement for Development of High Speed Removal Method of Oxide Layer
控制真空电弧阴极光斑移动开发高速去除氧化层方法
- 批准号:
18K04086 - 财政年份:2018
- 资助金额:
$ 2.5万 - 项目类别:
Grant-in-Aid for Scientific Research (C)
Development of Water-cooled Vortex Type of Wall-stabilized High Intensity Arc Lamp for Improvement of Lamp Efficiency and Color Rendering
开发水冷涡流式壁稳定高强度弧光灯以提高灯效和显色性
- 批准号:
26420251 - 财政年份:2014
- 资助金额:
$ 2.5万 - 项目类别:
Grant-in-Aid for Scientific Research (C)