Study on highly efficient laser-plasma light source and its applications for microfabrication and textural control of materials
高效激光等离子体光源及其在材料微细加工和织构控制中的应用研究
基本信息
- 批准号:21560752
- 负责人:
- 金额:$ 2.91万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for Scientific Research (C)
- 财政年份:2009
- 资助国家:日本
- 起止时间:2009 至 2011
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
Plasma expansions on micro-balloon lithium targets irradiated with coaxial double pulses and counter-streamed simultaneous two-pulses were observed by a time-resolved EUV camera. The counter-streamed pulses were confirmed to be more effective for uniform heating of the target. A soft X-ray conversion efficiency in a wavelength range of 5-17 nm in a cryogenic xenon rotating target was 25%/2πsr at the maximum. An attenuation coefficient of sputtering by the debris and an absorption coefficient of soft x-rays at 13.5 nm by argon gas were derived to be 2.2×10^<20> m^2 and 1.8×10^<-22> m^2, respectively. The attenuation coefficient of sputtering is concluded to be equivalent to the effective collision cross section. These parameters provide a useful design tool for realizing a practical soft x-ray source.
利用时间分辨极紫外相机观测了同轴双脉冲和逆流双脉冲同时辐照微球锂靶的等离子体膨胀。逆流脉冲被证实是更有效的均匀加热的目标。在5-17 nm波长范围内,低温氙旋转靶的软X射线转换效率最高可达25%/2πsr。碎片溅射的衰减系数和氩气对13.5 nm软X射线的吸收系数分别为2.2×10^<20>m^2和1.8×10^<-22>m^2。溅射衰减系数与有效碰撞截面等效。这些参数提供了一个有用的设计工具,实现一个实用的软X射线源。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
Influence of Laser Plasma Soft X-Ray Irradiation on Crystallization of a-Si Film by Infrared Annealing
激光等离子体软X射线照射对非晶硅薄膜红外退火晶化的影响
- DOI:
- 发表时间:2010
- 期刊:
- 影响因子:0
- 作者:Naoto Matsuo;Nobuya Isoda;Akira Heya;Sho Amano;Shuji Miyamoto;Takayasu Mochizuki;and Naoya Kawamoto
- 通讯作者:and Naoya Kawamoto
Influence of Laser Plasma Soft X-Ray Irradiation on Crystallixation of a-Si Film by Infrared Annealing
激光等离子体软X射线照射对非晶硅薄膜红外退火晶化的影响
- DOI:
- 发表时间:2010
- 期刊:
- 影响因子:0
- 作者:Naoto Matsuo;Nobuya Isoda;Akira Heya;Sho Amano;Shuji Miyamoto;Takayasu Mochizuki;Naoya Kawamoto
- 通讯作者:Naoya Kawamoto
Soft x-ray conversion efficiencies in laser-produced xenon and tin plasmas in a 5-17-nm wavelength range
激光产生的氙和锡等离子体在 5-17 nm 波长范围内的软 X 射线转换效率
- DOI:10.1143/jjap.50.098001
- 发表时间:2011
- 期刊:
- 影响因子:1.5
- 作者:Tomoaki Inoue;Takayasu Mochizuki;Shuji Miyamoto;Sho Amano and Takeo Watanabe
- 通讯作者:Sho Amano and Takeo Watanabe
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