Development and application of Nano-ion exchange lithography

纳米离子交换光刻技术(NiEL)是为了在透明玻璃衬底上制备不同折射率的纳米结构而发展起来的。还开发了一种适合NiEL的新的玻璃成分，以使单价离子在一定的高温下具有适当的离子电导率，并形成了多离子交换层，即下面是含Ag的芯层的含NH^4的无碱薄层。所开发的NiEL成功地在玻璃上绘制了纳米线；宽度为270 nm的细银金属线。这使人们能够利用“超材料”开发新的设备。

Nano-ion-exchange lithography(NIEL) has been developed for the fabrication of nanometer-size structure with different refractive index in/or on the transparent glass substrate. A new glass composition suitable for NIEL has also been developed to give appropriate ionic conductivities of monovalent ions at certain elevated temperature, and multi-ion-exchanged layer has also developed ; a thin NH^+_4 containing and alkali-free layer with Ag^+ containing core layer underneath. The developed NIEL succeeded in the drawing nano-lines on glass ; thin Ag metal lines with 270nm width. This enables to develop new devices using "metamaterials".