Development of micro-plasma molding using integrated fine electrodes

利用BN陶瓷制成的新型喷嘴和快速高压电源，通过控制从辉光区到电弧区范围内的放电，开发了小尺寸等离子体束的产生方法。新研制的等离子体束功率密度可达10^9 W/ m^2以上，在不锈钢阳极表面可获得亚毫米级的熔斑。为了获得更小直径的BN喷嘴，对BN的等离子体刻蚀性能和非线性光学光刻进行了表征。蚀刻速率约为2。当BN暴露于NLD Ar等离子体时为5 ilm/ h。

Generation method of very small size plasma beam was developed through controlling the electrical discharge in the range from glow region to arc region with use of the new type nozzle made from BN ceramics and the fast high voltage power source. The power density of newly developed plasma beam reaches higher than 10^9 W/ m^2 and sub-millimeter sized melt spot can be obtained at the surface of stainless steel anode. In order to obtain much smaller diameter of BN nozzle, characterizations of plasma etching properties of BN and nonlinear optical lithography were performed. The etching rate was approximately 2. 5 ilm/ h when BN was exposed to NLD Ar plasma.