Heteroepitaxial growth of GaN on Silicon spheres and its application for high power light emitting diodes
Heteroepitaxial growth of GaN on Silicon spheres and its application for high power light emitting diodes
批准号:
21760258
负责人:
ISHIKAWA Hiroyasu
金额:
$2.91万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Young Scientists (B)
财政年份:
2009
资助国家:
日本
项目状态:
已结题
起止时间:
2009 至 2010
中文摘要
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英文摘要
Novel technology based on GaN-on-silicon-sphere were investigated for high power and better light extraction efficiency GaN-based LEDs. Using Si (100) substrates as support submounts, silicon spheres could be fixed and unfixed on the submounts with low-melting-point lead glass. Moreover, correlation between luminescence characteristics and nanostructures in GaInN MQWs on Si substrates was investigated for improved performance. There was a strong correlation between strong luminescence characteristics and their nano- and micro-structures.
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デンドライトウェブSi基板上GaInN MQW LEDの試作
枝晶网状硅衬底上的 GaInN MQW LED 原型
DOI:
--
发表时间:
2009
期刊:
影响因子:
--
作者:
[石川博康, 森直人, 嶋中啓太, 原陽介, 中西正美]
通讯作者:
中西正美
Improved MOCVD growth of GaN on Si-on-porous-silicon substrates
改进了多孔硅衬底上硅上 GaN 的 MOCVD 生长
DOI:
--
发表时间:
2010
期刊:
phys.stat.solidi C Vol.7
影响因子:
--
作者:
[H.Ishikawa, K.Shimanaka, M.Azfar bin M.Amir, Y.Hara, M.Nakanishi]
通讯作者:
M.Nakanishi
Improved MOCVD growth of GaN on Si-on-porous-silicon sbstrates
多孔硅衬底上硅的改进 MOCVD 生长
DOI:
--
发表时间:
2009
期刊:
影响因子:
--
作者:
[H.Ishikawa, K.Shimanaka, M.Azfar bin M.Amir, Y.Hara M.Nakanishi]
通讯作者:
Y.Hara M.Nakanishi
Reduction of threading dislocations in GaN on in-situ metlback-etched Si substrates
减少原位回熔蚀刻硅衬底上 GaN 中的穿透位错
DOI:
--
发表时间:
2011
期刊:
J.Crystal Growth Vol.315
影响因子:
--
作者:
[H.Ishikawa, K.Shimanaka]
通讯作者:
K.Shimanaka
PL and structuralstudies of GaInN MQWs grown on Si substrates
Si 衬底上生长的 GaInN MQW 的 PL 和结构研究
DOI:
--
发表时间:
2010
期刊:
影响因子:
--
作者:
[H.Ishikawa, N.Mori]
通讯作者:
N.Mori
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负责人:ISHIKAWA Hiroyasu
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依托单位: