Development of novel mechano-luminesence thin film.

Mn掺杂ZnS是一种很有前途的应力致发光材料。本文研究了用沉积法制备ZnS：Mn薄膜的可行性，并研究了ZnS：Mn薄膜的光致发光特性与沉积薄膜的微结构的关系。对ZnS：Mn粉末进行了各种应力条件下的力学性能测试。ZnS：Mn粉末在环氧树脂中的混合物表现出光致发光（PL）和机械致发光（ML），且机械致发光的强度随着填充量的增加而增强。在离子束溅射沉积ZnS薄膜时，由于靶材的离子性极化电荷的存在，需要中和离子束。通过在ZnS和Si衬底之间添加Cu缓冲层，可以减少薄膜在沉积过程中和沉积后的开裂和剥落。X射线反射反映了薄膜与衬底之间晶格失配引起的界面应力的调节作用。然而，在IBS和电阻热沉积法沉积的薄膜中几乎没有观察到PL行为。这可能是由于膜内Mn的含量在替代晶格点处不足，因为随后在Ar气氛中的热处理提供了PL。

Mn doped ZnS is promising for the stress induced light emitting material. The present work examined the feasibility of production of ZnS:Mn film by deposition methods, and the photoluminescence behaviors with related to the microstructure of deposited film. The mechanical tests under various stress conditions have been conducted for ZnS:Mn powder. The mixture of ZnS:Mn powder embedded in epoxy shows photo-luminescence (PL) and mechano-luminescence (ML), and the magnitude of ML is enhanced by the concentrated loading condition. Regarding to the ion beam sputtering deposition of ZnS film, neutralized ion beam is required because the polarization charge of ionic nature of target matetial. The clack and peeling of the film during and after deposition can be reduced by intermediate Cu buffer layer between ZnS and Si substrate. X-ray reflection implies the accommodation of interfacial stress caused by lattice mismatch between films and substrate. However, PL behavior is hardly observed in deposited films by IBS and also the resistive heat deposition method. This might be due to the contents of Mn inside the film is insufficient at the substitutional lattice points since subsequent heat treatment in Ar atmosphere provides PL.