Quantitative evaluation and active control of tritiumrecycling in the plasma facing materials during mixed ion implantations

本文对混合离子束辐照下氚在面向等离子体材料表面的再循环进行了定量评价。提出了考虑材料影响的氚再循环模型，阐明了氚再循环与材料辐照损伤的相关性。研究了氢离子注入过程中氘在钨（W）中的滞留行为和碳注入W、HOPG和WC的溅射行为。

In this study, the quantitative evaluation of tritium recycling on the surface of plasma facing materials under the mixed ion implantations was performed. To propose tritium recycling model including the effect of materials, correlation between tritium recycling and irradiation damage of materials was elucidated. Deuterium retention behaviors in the tungsten(W) and sputtering behaviors for the carbon implanted W, HOPG and WC during hydrogen ion implantation were evaluated.