Inelastic X-ray scattering studies of a novel electronic state induced by the interferences among multiple low-energy excitations

为了阐明声子色散关系和材料中声子激发的性质，进行了高分辨率非弹性x射线散射。我们将该技术应用于声子激发和电子激发之间的干扰现象的研究，例如强相关f电子系统中由f电子产生的晶体电场（CEF）激发。在pros_4sb_ <12>-PrRu_4Sb_<12>体系中，我们成功地观察到了声子与CEF激发之间的干涉现象。我们还研究了由f电子引起的声子与电荷波动之间的干扰现象。

High resolution inelastic X-ray scattering has been carried out in order to elucidate phonon dispersion relations and nature of phonon excitations in materials. We applied this technique to the investigation of interference phenomena between phonon excitation and electronic excitations such as crystal electric field (CEF) excitations originated from f-electrons in strongly correlated f-electron systems. We succeeded in the observation of the interference phenomenon between a phonon and CEF excitations inPrOs_4Sb_<12>-PrRu_4Sb_<12> system. We also investigated interference phenomena between phonon and charge fluctuation due to f-electrons.