High quality Quantum Dots for 1.55 micron wavelength on GaAs substrate
High quality Quantum Dots for 1.55 micron wavelength on GaAs substrate
批准号:
22560016
负责人:
SUGIMOTO Yoshimasa
金额:
$2.75万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2010
资助国家:
日本
项目状态:
已结题
起止时间:
2010 至 2012
中文摘要
Extensions of emission wavelength of InAs/GaAs QDs by using bi-layer QD growth have been investigated.The extension has been found with an enlargement of the upper layer(Active)QDs occurred by optimizing several growth parameters:growth temperature of lower(Seed)QDs,amount of InAs supplied for seed-and active-QDs。These optimized parameters lowered the density of the seed-QDs strain spreading upward,which resulted in an enlargement of the active-QDs。We achieved a control of the extension of emission wavelength up to approximately 1.4·m.We also studied the growth of GaNAs/AlGaAs heterostructures on GaAs(100)substrates by plasma-assisted molecular beam epitaxy.By introducing periodic growth interruption and nitrogen(N)supply to the interrupted surfaces during the growth of GaNAs,we achieved high controllability of the average N concentration in GaNAs layers.We observed three-dimensional island growth of GaNAs on the N-rich surfaces.Extensions of emission wavelength of InAs/GaAs QDs by using bi-layer QD growth have been investigated.The extension has been found with an enlargement of the upper layer(Active)QDs occurred by optimizing several growth parameters:growth temperature of lower(Seed)QDs,amount of InAs supplied for seed-and active-QDs。These optimized parameters lowered the density of the seed-QDs strain spreading upward,which resulted in an enlargement of the active-QDs。We achieved a control of the extension of emission wavelength up to approximately 1.4·m.We also studied the growth of GaNAs/AlGaAs heterostructures on GaAs(100)substrates by plasma-assisted molecular beam epitaxy.By introducing periodic growth interruption and nitrogen(N)supply to the interrupted surfaces during the growth of GaNAs,we achieved high controllability of the average N concentration in GaNAs layers.We observed three-dimensional island growth of GaNAs on the N-rich surfaces.
英文摘要
Extensions of emission wavelength of InAs/GaAs QDs by using bi-layer QD growth have been investigated. The extension has been found with an enlargement of the upper layer (active) QDs occurred by optimizing several growth parameters: growth temperature of lower (seed) QDs, amount of InAs supplied for seed- and active-QDs. These optimized parameters lowered the density of the seed-QDs strain spreading upward, which resulted in an enlargement of the active-QDs. We achieved a control of the extension of emission wavelength up to approximately 1.4 ・m. We also studied the growth of GaNAs/AlGaAs heterostructures on GaAs (100) substrates by plasma-assisted molecular beam epitaxy. By introducing periodic growth interruption and nitrogen (N) supply to the interrupted surfaces during the growth of GaNAs, we achieved high controllability of the average N concentration in GaNAs layers. We observed three-dimensional island growth of GaNAs on the N-rich surfaces.Extensions of emission wavelength of InAs/GaAs QDs by using bi-layer QD growth have been investigated. The extension has been found with an enlargement of the upper layer (active) QDs occurred by optimizing several growth parameters: growth temperature of lower (seed) QDs, amount of InAs supplied for seed- and active-QDs. These optimized parameters lowered the density of the seed-QDs strain spreading upward, which resulted in an enlargement of the active-QDs. We achieved a control of the extension of emission wavelength up to approximately 1.4 ・m. We also studied the growth of GaNAs/AlGaAs heterostructures on GaAs (100) substrates by plasma-assisted molecular beam epitaxy. By introducing periodic growth interruption and nitrogen (N) supply to the interrupted surfaces during the growth of GaNAs, we achieved high controllability of the average N concentration in GaNAs layers. We observed three-dimensional island growth of GaNAs on the N-rich surfaces.
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DOI:
10.1016/j.jcrysgro.2012.12.110
发表时间:
2013-09
期刊:
Journal of Crystal Growth
影响因子:
1.8
作者:
[N. Ozaki;Y. Nakatani;S. Ohkouchi;N. Ikeda;Y. Sugimoto;K. Asakawa;E. Clarke;R. Hogg]
通讯作者:
N. Ozaki;Y. Nakatani;S. Ohkouchi;N. Ikeda;Y. Sugimoto;K. Asakawa;E. Clarke;R. Hogg
周期的成長中断を用いたGaNAs三次元島状構造の作製
利用周期性生长中断制造 GaN 三维岛结构
DOI:
--
发表时间:
2012
期刊:
影响因子:
--
作者:
[関野高明, ら]
通讯作者:
ら
近接二層積層によるGaAs基板上InAs-QDの発光長波長化の検討(II)
通过堆叠相邻两层来增加GaAs衬底上InAs-QDs发射波长的研究(二)
DOI:
--
发表时间:
2013
期刊:
影响因子:
--
作者:
[H.Ueda, T.Kanki, H.Tanaka, 中谷擁平,尾崎信彦,大河内俊介,池田直樹,杉本喜正,Edmund Clarke,Richard Hogg]
通讯作者:
中谷擁平,尾崎信彦,大河内俊介,池田直樹,杉本喜正,Edmund Clarke,Richard Hogg
窒素デルタドーピングを用いたGaNAs量子井戸の窒素濃度制御
使用氮δ掺杂控制 GaN 量子阱中的氮浓度
DOI:
--
发表时间:
2011
期刊:
影响因子:
--
作者:
[間野高明, 定昌史, 黒田隆, M.Elborg, 野田武司, 杉本喜正, 迫田和彰]
通讯作者:
迫田和彰
AlAs中のN等電子中心
AlAs 中的 N 等电子中心
DOI:
--
发表时间:
2012
期刊:
影响因子:
--
作者:
[K.Iwai, M.Miyagi, Y.Shi, Y.Matsuura, 定昌史]
通讯作者:
定昌史
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