Development and application of x-ray analyzers using multiple Bragg diffraction

在利用同步辐射x射线进行材料研究中，x射线偏振仪对于强关联体系和磁性的研究是非常有用的。然而，传统的X射线分析仪有两个缺点：1)可用波长有限；2)它对光子的螺旋度不敏感。为了解决这些问题，我们研制并改进了利用X射线晶体多次衍射的X射线MBD分析仪。此外，我们还发展了偏振控制的掠射角x射线形貌术，并观测到了位于外延4H-SiC片表层的缺陷和应变场。

In materials research using synchrotron x-rays, x-ray polarization analyzer is quite useful for the investigations of strongly correlated systems and magnetism. However, the conventional x-ray analyzer has two disadvantages: 1) the available wavelength is limited and 2) it is insensitive to the helicity of the photons. In order to solve these problems, we have developed and improved the x-ray MBD analyzer which makes use of x-ray-multiple-diffraction by a crystal. Further, we have developed polarization-controlled glancing-angle x-ray topography and observed defects and strain fields located in the surface layer of an epitaxial 4H-SiC wafer.