Development of low damage high rate sputter-deposition process for the fabrication of OLED

开发用于 OLED 制造的低损伤高速率溅射沉积工艺

• 批准号: 23560374
• 负责人: HOSHI YOICHI
• 金额: $ 3.49万
• 依托单位: Tokyo Polytechnic University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 2011
• 资助国家: 日本
• 起止时间: 2011 至 2013
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-23560374/
• 关键词: 有機EL素子; スパッタ成膜; 低ダメージスパッタ; 電極膜; 仕事関数; 対向ターゲット式スパッタ; プラズマダメージ; 網電極; 上部電極膜; 高エネルギー粒子; 斜め入射堆積; 網マスク; メッシュ電極; 酸化モリブデン; スパッタ堆積; キャリア注入特性; 2次電子

In the fabrication of an organic light emitting diode (OLED), the deposition of top electrode films by using the sputtering technique led to a significant increase in its operating voltage. Therefore, the development of a sputter-deposition process without such unwanted phenomena is greatly desired. In this work, we have proposed low damage facing target sputtering (FTS) method for the deposition of the top electrode films with significantly low levels of damage and tried to confirm the effectiveness of the sputter-deposition method. As a results, it was clarified that the low damage FTS was useful to improve the operating characteristics of the OLED, although a complete suppression of the incidence of high energy secondary electrons to the substrate was necessary. In addition, optimization of the sputtering conditions such as sputtering gas pressure and sputtering current were also effective to improve the operating characteristics of the OLED.

在有机发光二极管（OLED）的制作中，通过使用溅射技术沉积顶部电极膜导致其工作电压的显著增加。因此，非常需要开发一种没有这种不希望的现象的沉积工艺。在这项工作中，我们已经提出了低损伤面向靶溅射（FTS）的方法，用于沉积的顶部电极膜具有显着的低水平的损害，并试图确认的有效性的溅射沉积方法。结果表明，尽管完全抑制高能二次电子入射到衬底上是必要的，但低损伤FTS对改善OLED的工作特性是有用的。此外，溅射条件的优化，如溅射气体压力和溅射电流也是有效的，以改善OLED的工作特性。

项目成果

TiO2膜の高速低温スパッタ成膜法

TiO2薄膜的高速低温溅射方法

• 发表时间: 2014
• 期刊: Journal of the Vacuum Society of Japan
• 作者: K. Mimura;S. Motonami;Y. Shim;K. Wakita;Z. Jahangirli;O. Alekperov;N. Mamedov;H. Sato;Y. Utsumi;S. Ueda;K. Shimada;Y. Taguchi;K. Kobayashi;H. Namatame;and M. Taniguchi;星陽一
• 通讯作者: 星陽一

薄膜デバイス研究室

薄膜器件实验室

Thermal Crystallization of Amorphous Tin Oxide Thin Films Fabricated by Spray Chemical Vapor Deposition

喷雾化学气相沉积法制备非晶态氧化锡薄膜的热结晶

• 作者: T. Suzuki;Y. Seki;Y. Sawada;T. Uchida;Y. Hoshi;Li-xian SUN
• 通讯作者: Li-xian SUN

斜め入射堆積法により作製したTiO2膜の熱処理効果

斜入射沉积法制备TiO2薄膜的热处理效果

• 作者: Kazunari Shinbo;Yasuo Ohdaira;Akira Baba;Keizo Kato and Futao Kaneko;星陽一，平井照通，北原直人
• 通讯作者: 星陽一，平井照通，北原直人

Co-catalytic effect on improving the photocatalytic properties of TiO_2 films

共催化提高TiO_2薄膜光催化性能

• 发表时间: 2013
• 期刊: Trans. Mat. Res. Soc. Japan
• 作者: Masaki Isai;Ikuta Nakamura;Yuki Hieda;Fumiya Fukazawa;and Yoichi Hoshi
• 通讯作者: and Yoichi Hoshi