Fabrication and charakterization of magnetic alloys and nanostructures for high density magnetic recording

用于高密度磁记录的磁性合金和纳米结构的制造和表征

• 批准号: 5406615
• 负责人: Professor Dr. Manfred Albrecht
• 金额: --
• 依托单位: Lehrstuhl für Experimentalphysik IV
• 依托单位国家: 德国
• 项目类别: Independent Junior Research Groups
• 财政年份: 2003
• 资助国家: 德国
• 起止时间: 2002-12-31 至 2009-12-31
• 项目状态: 已结题
• 来源: https://gepris.dfg.de/gepris/projekt/5406615?language=en
• 关键词: Fabrication; charakterization; magnetic; alloys; nanostructures

In this research project we plan to investigate the structural and magnetic properties of magnetic alloy films and multilayers with strong perpendicular magneto-crystalline anisotropy grown on low energy surfaces (i.e. Dichalcogenide semiconductors), which presents a new way to stabilize ordered alloys at low temperatures, for potential magnetic recording applications at ultra-high density. A variety of parameters (substrate surface, orientation, composition, growth rate, temperature) can be used to alter the magnetic properties, which are strongly related to the atomic structure and chemical ordering. Another approach for extending magnetic storage densities is to store data on patterns of magnetic nanostructures. Periodic arrays of sub-100 nm magnetic alloy nanostructures ("quantum disk") will be fabricated by electron-beam lithography. Magnetic properties like switching field distribution, magneto-optical activity and thermal stability will be correlated to the full film properties. In addition, alternative approaches will be investigated in particular lithography techniques using self-assembled monolayers. A quasi-static write/read tester (SMRM) will be built. which allows to perform recording experiments (i.e. "dynamic coercivity") on nanostructure arrays as well as on individual nanostructures.

在本研究项目中，我们计划研究在低能表面（即二硫族化物半导体）上生长的具有强垂直磁晶各向异性的磁性合金薄膜和多层膜的结构和磁性，这为在低温下稳定有序合金提供了一种新的方法，用于超高密度的潜在磁记录应用。各种参数（衬底表面、取向、组成、生长速率、温度）可用于改变磁性，这些磁性与原子结构和化学有序性密切相关。用于扩展磁存储密度的另一种方法是将数据存储在磁性纳米结构的图案上。亚100纳米磁性合金纳米结构（“量子盘”）的周期性阵列将通过电子束光刻制造。磁性能如开关场分布、磁光活性和热稳定性将与整个膜的性能相关。此外，替代的方法将特别是使用自组装单层的光刻技术进行研究。将建立一个准静态写/读测试仪（SMRM）。其允许在纳米结构阵列以及单个纳米结构上进行记录实验（即“动态折射率”）。