Development of De-molding Agent-Free Resin Mold for UV Nanoimprint
Development of De-molding Agent-Free Resin Mold for UV Nanoimprint
批准号:
23655218
负责人:
SHIRAI Masamitsu
金额:
$2.5万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Challenging Exploratory Research
财政年份:
2011
资助国家:
日本
项目状态:
已结题
起止时间:
2011 至 2012
中文摘要
在UV压印过程中,石英模具的结垢是一个严重的问题。建立了复制树脂模具的制作工艺。在此基础上,设计了一种无需脱模剂处理的复制树脂模具。评价了再模具表面性能与UV固化树脂表面性能之间的关系。
英文摘要
The fouling of the quartz mold during the UV imprint process is a serious problem. A process for making the replicated resin mold was established. Furthermore, the replicated resin mold which was not required a treatment with de-molding agent was devised. A relationship between the surface property of the reinmold and that of the UV cured resin surface was evaluated.
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Novel Resin Mold for UV nanoimprint: A Demolding Agent Free System
用于 UV 纳米压印的新型树脂模具:无脱模剂系统
DOI:
--
发表时间:
2011
期刊:
影响因子:
--
作者:
[Yuki Kimura, K.K. Tanaka, H. Miura, K. Tsukamoto, M. Shirai, M. Shirai]
通讯作者:
M. Shirai
リワーク型多官能メタクリラートのUVインプリント材料への応用
改性多功能甲基丙烯酸酯在UV压印材料中的应用
DOI:
--
发表时间:
2011
期刊:
影响因子:
--
作者:
[松川大作, 村上雄基, 岡村晴之, 白井正充]
通讯作者:
白井正充
Novel Monomers with Degradable Property and Their Applications to UV Imprint Lithography
新型可降解单体及其在紫外压印光刻中的应用
DOI:
--
发表时间:
2011
期刊:
影响因子:
--
作者:
[Jun Nozawa, Katsuo Tsukamoto, Willem van Enckevort, Tomoki Nakamura, Yuki Kimura, Hitoshi Miura, Hisao Satoh,Ken Nagashima, Makoto Konoto, M. Shirai]
通讯作者:
M. Shirai
Photoacid- and Photobase-Generating Monomers for Surface Modification of Cured Resin: Application to Novel Resin Mold for UV Imprint
用于固化树脂表面改性的光酸和光碱生成单体:在新型 UV 压印树脂模具中的应用
DOI:
10.2494/photopolymer.25.735
发表时间:
2012
期刊:
Journal of Photopolymer Science and Technology
影响因子:
0.8
作者:
[S. Horii, Keisuke Yamane, Haruyuki Okamura, M. Shirai]
通讯作者:
M. Shirai
離型剤フリーなUVインプリント用モールドのための樹脂材料
UV压印模具用无脱模剂树脂材料
DOI:
--
发表时间:
2011
期刊:
影响因子:
--
作者:
[浦川理, 信川省吾, 四方俊幸, 井上正志, 阿久津恵一, 堀井俊哉]
通讯作者:
堀井俊哉
共 36 条
UV Curable Resins with Degradable Property and Their Application for Sacrificial Materials
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批准号:21350128
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$12.48万
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财政年份:2009
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负责人:SHIRAI Masamitsu
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依托单位:
Studies on Environmentally Friendly Photocrosslinkable Polymers
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批准号:13450382
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$9.22万
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财政年份:2001
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负责人:SHIRAI Masamitsu
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依托单位:
Synthesis of Photoacid-and Photobase-Generating Polymers and Its Applications
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批准号:11650912
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$0.58万
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财政年份:1999
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负责人:SHIRAI Masamitsu
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依托单位:
Chemical Modification of Surface of Polymer Thin Film Using Photochemical Reaction and Its Application
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批准号:06805084
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$1.22万
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财政年份:1994
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负责人:SHIRAI Masamitsu
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依托单位:
Synthesis of Photodimerizable Poly(crown ether)s and Their Application
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批准号:61550683
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$1.09万
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财政年份:1986
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负责人:SHIRAI Masamitsu
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依托单位: