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Stress analysis of implant-retained maxillary overdenture without palatal plate.

Stress analysis of implant-retained maxillary overdenture without palatal plate.
无腭板种植体固位上颌覆盖义齿的应力分析。
批准号:
23792211
负责人:
HIRAJIMA Yuuki
金额:
$1.66万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Young Scientists (B)
财政年份:
2011
资助国家:
日本
项目状态:
已结题
起止时间:
2011 至 2012

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中文摘要
翻译
对上颌种植覆盖义齿(IOD)的应力集中部位进行了研究。采用有限元法和4个种植体通过圆杆连接,建立上颌无牙颌硅胶人工黏膜模型,利用应变片对第一磨牙进行垂直载荷和应力分析。结果表明,在本研究中,压缩应力在义齿基托树脂靠近夹头末端处应用最多。
英文摘要
The stress concentration part of an implant-retained maxillary overdenture(IOD) was examined. Finite element method and four implants were connected by round bars, the upper jaw edentulous jaw model which carried silicone artificial mucosa was built, using strain gages, the perpendicular load was carried out and stress analysis was performed to first molars. As result, It turned out that compression stress is most applied to denture base resin near the end of a clip in the present study.
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