Fablication of novel spintronic devices using MTJs with magnetic insulators
Fablication of novel spintronic devices using MTJs with magnetic insulators
批准号:
23686006
负责人:
NAGAHAMA Taro
金额:
$6.74万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Young Scientists (A)
财政年份:
2011
资助国家:
日本
项目状态:
已结题
起止时间:
2011-11-18 至 2014-03-31
中文摘要
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英文摘要
In the spintronics research fields, MRAM and STT-RAM have attracted much attention. In the devices, magnetic tunnel junctions (MTJs) are the most impotant elements. The STT-RAM employs the spin torque transfer magnetization reversal to switch the magnetization on very low power. In 2010, Slonczewski proposed that the magnetization is reversed effectively by the spin current generated by spin wave in magnetic insulator. However, the MTJs with magnetic oxide insulator are not reported so far. In this study, we fabricated the epitaxial MgO-MTJs with spinel ferrite oxide using reactive molecular beam epitaxy.From the RHEED and AFM observations, Pt is more appropriate for the insertion layer between Fe and ferrite layers than Cr and Au. Regarding the magnetization process, the saturation field was enhanced by insertion of the non-magnetic layer. The MTJ devices fabricated by e-beam lithography exhibited TMR effects of 70%.
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CoFe_2O_4/Cr/Fe系の磁化過程のCr膜厚依存性
CoFe_2O_4/Cr/Fe体系中磁化过程的Cr膜厚度依赖性
DOI:
--
发表时间:
2013
期刊:
影响因子:
--
作者:
[金田昭男, 金潤碩, 船戸 充, 川上養一, 塩谷陽平, 京野孝史, 上野昌紀, 中村孝夫, 川井智博,平谷俊悟,長浜太郎,島田敏宏]
通讯作者:
川井智博,平谷俊悟,長浜太郎,島田敏宏
MgO-MTJ/Pt/CoFe2O4 の作製と磁気伝導特性
MgO-MTJ/Pt/CoFe2O4的制备及其导磁性能
DOI:
--
发表时间:
2013
期刊:
影响因子:
--
作者:
[Haketa, Y.; Maeda, H, 高橋 望,平谷俊悟,長浜太郎,島田敏宏]
通讯作者:
高橋 望,平谷俊悟,長浜太郎,島田敏宏
CoCr2O4スピネルを用いたトンネル磁気抵抗素子の作製
CoCr2O4尖晶石隧道磁阻元件的制作
DOI:
--
发表时间:
2013
期刊:
影响因子:
--
作者:
[A. Tsukazaki, A. Ohtomo, M. Kawasaki, 楯 和也,松田悠弥,長浜太郎,島田敏宏]
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楯 和也,松田悠弥,長浜太郎,島田敏宏
CoCr_2O_4スピネルを用いたトンネル磁気抵抗素子の作製
CoCr_2O_4尖晶石隧道磁阻元件的制作
DOI:
--
发表时间:
2013
期刊:
影响因子:
--
作者:
[A. Kaneta, M. Funato and Y. Kawakami, 楯和也,松田悠弥,長浜太郎,島田敏宏]
通讯作者:
楯和也,松田悠弥,長浜太郎,島田敏宏
Fabrication of epitacial films of magnetic spinel materials by molecular beam epitaxy method
分子束外延法制备磁性尖晶石材料外延薄膜
DOI:
--
发表时间:
2012
期刊:
影响因子:
--
作者:
[T. Nagahama, Y. Matsuda, K. Tate, S. Hiratani, Y. Watanabe, T. Shimada]
通讯作者:
T. Shimada
共 16 条
Fabrication of MgO-magnetic tunnel transistor
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批准号:20042012
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项目类别:Grant-in-Aid for Scientific Research on Priority Areas
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资助金额:$1.28万
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财政年份:2008
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负责人:NAGAHAMA Taro
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依托单位:
海外基金